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首页> 外文期刊>Journal of Crystal Growth >Preparation and characterization of BiFeO_3/LaNiO_3 heterostructure films grown on silicon substrate
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Preparation and characterization of BiFeO_3/LaNiO_3 heterostructure films grown on silicon substrate

机译:硅衬底上生长的BiFeO_3 / LaNiO_3异质结构膜的制备与表征

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摘要

BiFeO_3/LaNiO_3 (BFO/LNO) heterostructure films are fabricated directly on Si (100) substrate. The LaNiO_3 layer, which is prepared by chemical solution deposition, is used both as the seed layer to improve the quality of BiFeO_3 layer, and as the bottom electrode for the electrical measurement. The BiFeO_3 layer, which is fabricated by pulsed laser deposition, presents compact microstructure with grain size about 100 nm. Saturated hysteresis loops of polarization vs. applied voltage have been measured at the frequency of 1 kHz. The value of remnant polarization is about 40 μC/cm~2. The frequency dependence of capacitance and loss tangent of the heterostructure is also studied. All the results of the electrical measurements indicate that the effect of leakage current has been suppressed in the BFO/LNO heterostructure. The results are significative for the application of BiFeO_3 films in microelectronic devices.
机译:BiFeO_3 / LaNiO_3(BFO / LNO)异质结构膜直接在Si(100)衬底上制造。通过化学溶液沉积制备的LaNiO_3层既用作提高BiFeO_3层质量的种子层,又用作电测量的底部电极。通过脉冲激光沉积制造的BiFeO_3层具有致密的微观结构,晶粒尺寸约为100 nm。已在1 kHz的频率下测量了极化相对于施加电压的饱和磁滞回线。剩余极化值约为40μC/ cm〜2。还研究了电容的频率依赖性和异质结构的损耗角正切。电气测量的所有结果表明,漏电流的影响已在BFO / LNO异质结构中得到抑制。结果对于BiFeO_3薄膜在微电子器件中的应用具有重要意义。

著录项

  • 来源
    《Journal of Crystal Growth》 |2010年第4期|617-620|共4页
  • 作者单位

    Key Laboratory of Polar Materials and Devices of Ministry of Education, East China Normal University, Shanghai 200241, People's Republic of China Department of Physics, East China Normal University, Shanghai 200241, People's Republic of China National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China;

    rnKey Laboratory of Polar Materials and Devices of Ministry of Education, East China Normal University, Shanghai 200241, People's Republic of China Department of Physics, East China Normal University, Shanghai 200241, People's Republic of China National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China;

    rnKey Laboratory of Polar Materials and Devices of Ministry of Education, East China Normal University, Shanghai 200241, People's Republic of China Department of Physics, East China Normal University, Shanghai 200241, People's Republic of China National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China;

    rnKey Laboratory of Polar Materials and Devices of Ministry of Education, East China Normal University, Shanghai 200241, People's Republic of China Department of Physics, East China Normal University, Shanghai 200241, People's Republic of China National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China;

    rnKey Laboratory of Polar Materials and Devices of Ministry of Education, East China Normal University, Shanghai 200241, People's Republic of China Department of Physics, East China Normal University, Shanghai 200241, People's Republic of China National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China;

    rnKey Laboratory of Polar Materials and Devices of Ministry of Education, East China Normal University, Shanghai 200241, People's Republic of China Department of Physics, East China Normal University, Shanghai 200241, People's Republic of China National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A3. Polycrystalline deposition; B1. Perovskite; B2. Ferroelectric materials; B2. Dielectric material.;

    机译:A3。多晶沉积;B1。钙钛矿;B2。铁电材料;B2。介电材料。;

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