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机译:MOVPE使用纯净环境N_2中具有不同V / III比的TBP生长的AlInP的原子有序
School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore 639798, Singapore;
School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore 639798, Singapore;
Institute of Material Research and Engineering, 3 Research Link, Singapore 117602, Singapore;
Institute of Material Research and Engineering, 3 Research Link, Singapore 117602, Singapore;
A1. Spontaneous atomic ordering; A3. Organometallic vapor phase epitaxy; B2. Semiconducting III-V materials;
机译:在纯N_2环境中使用TBP和TBA进行无铝808 nm高功率激光器的MOVPE生长
机译:在N_2环境中使用叔丁基ar(TBA)和叔丁基膦(TBP)生长InP和InGaAs的金属有机气相外延(MOVPE)生长
机译:叔丁基膦在纯N_2环境中MOVPE生长Al_xIn_(1-x)P
机译:使用CP_2MG掺杂在氮气或氢气环境中的alinP的Movpe中
机译:原子层沉积生长的铜的集成,用于高级互连应用。
机译:退火环境对原子层沉积生长LaAlO3薄膜性能的影响
机译:AP-MOVPE中的原子配置生长X射线光电子光谱与散装和表面表征技术联合的X射线光电子谱凸出的晶格 - 失配的夹具薄膜