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机译:MOCVD生长的GaInP外延层中的相分离现象
Institute of Precision Engineering, National Chung Hsing University, Taichung 402, Taiwan, R.O.C;
Institute of Precision Engineering, National Chung Hsing University, Taichung 402, Taiwan, R.O.C;
Institute of Electro-Optical and Materials Science, National Formosa University, Yunlin 632, Taiwan, R.O.C;
Institute of Precision Engineering, National Chung Hsing University, Taichung 402, Taiwan, R.O.C;
Institute of Precision Engineering, National Chung Hsing University, Taichung 402, Taiwan, R.O.C;
Department of Materials Engineering, National Chung Hsing University, Taichung 402, Taiwan, R.O.C;
Department of Electronic Engineering, National Changhua University of Education, Changhua 500, Taiwan, R.O.C;
A1. Stresses; A1. S-ray diffraction; A3. Metalorganic chemical vapor deposition; B1. GainP;
机译:通过成分逐步分级的Ga_(1-x)In_xP多层膜消除金属有机化学气相沉积生长的GaInP外延层中的相分离
机译:利用湿法和干法缺陷选择性刻蚀研究MOCVD生长的GaN外延层的位错密度
机译:在硅衬底上的MOCVD生长的InGaAs外延层上制造的低界面陷阱密度Al_2O_3 / In_(0.53)Ga_(0.47)As MOS电容器
机译:InGaN外延层中的相分离
机译:氮化铟镓/氮化镓多量子阱和氮化铟镓外延层中的相分离和反转畴边界。
机译:泵浦价带光发射研究外延FeRh层中的激光诱导相变
机译:应变对外延层相分离影响的理论研究
机译:CmR材料中传输电流的空间分布成像和纳米相位分离现象。