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首页> 外文期刊>Journal of Crystal Growth >Residual Stress Relaxation In Gan/sapphire Circular Pillars Measured By Raman Scattering Spectroscopy
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Residual Stress Relaxation In Gan/sapphire Circular Pillars Measured By Raman Scattering Spectroscopy

机译:用拉曼散射光谱法测量的甘/蓝宝石圆形柱中的残余应力松弛

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摘要

Circular pillar structures of various diameters have been prepared by a focused ion beam (FIB) through a 4-um-thick epitaxial gallium nitride (GaN) film grown on a sapphire substrate. Micro-Raman scattering is used to measure residual stresses based on the shift of an E_2 phonon in the GaN film. Measurements of residual stress profiles are compared to Winkler's elastic formalism for a shear-supported film with proper boundary conditions. The model, optimized at a cleave edge, is compared to the experimental shape of stress variations inside and outside the pillar structures.
机译:通过聚焦的离子束(FIB)穿过生长在蓝宝石衬底上的4um厚的外延氮化镓(GaN)膜,已经制备了各种直径的圆形柱状结构。微观拉曼散射用于基于GaN膜中E_2声子的位移来测量残余应力。对于具有适当边界条件的剪切支撑薄膜,将残余应力分布的测量结果与Winkler的弹性形式进行比较。将在劈裂边缘优化的模型与柱结构内部和外部的应力变化的实验形状进行了比较。

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