...
首页> 外文期刊>Journal of Crystal Growth >Epitaxial growth of ferromagnetic Fe_3N films on Si(1 1 1) substrates by molecular beam epitaxy
【24h】

Epitaxial growth of ferromagnetic Fe_3N films on Si(1 1 1) substrates by molecular beam epitaxy

机译:Si(1 1 1)衬底上通过分子束外延外延生长Fe_3N铁磁薄膜

获取原文
获取原文并翻译 | 示例
           

摘要

c-Axis-oriented hexagonal Fe_3N films were epitaxially grown on Si(1 1 1) substrates by molecular beam epitaxy using AlN/3C-SiC intermediate layers. Fe_3N epitaxial film grown on AlN/3C-SiC/Si(1 1 1) has a smooth surface and atomically flat two-dimensional terraces. It was found that the magnetic moments of Fe3N epitaxial film faced parallel to the film plane, and that the saturation magnetization per Fe atom was approximately 1.8 μ_b at 5K, where μ_b is the Bohr magneton. The nitrogen composition in Fe_xN (2 < x < 3), and thus its magnetic properties, could be controlled even after the growth by irradiation of a radical nitrogen beam.
机译:使用AlN / 3C-SiC中间层通过分子束外延在cSi(1 1 1)衬底上外延生长c轴取向的六方Fe_3N薄膜。在AlN / 3C-SiC / Si(1 1 1)上生长的Fe_3N外延膜具有光滑的表面和原子平坦的二维平台。发现Fe3N外延膜的磁矩与膜平面平行,并且每个Fe原子的饱和磁化强度在5K下约为1.8μ_b,其中μ_b是玻尔磁子。 Fe_xN(2

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号