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首页> 外文期刊>Journal of Crystal Growth >Numerical investigation of crucible rotation effect on crystallization rate behavior during Czochralski growth of Si_(1-x)Ge_x crystals
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Numerical investigation of crucible rotation effect on crystallization rate behavior during Czochralski growth of Si_(1-x)Ge_x crystals

机译:Si_(1-x)Ge_x晶体的直拉生长过程中坩埚旋转对结晶速率行为的数值研究

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摘要

Crucible rotation effect on crystallization rate behavior during CZ Si_(1-x)Ge_x growth has been numerically studied for several crystal positions of the growth, including the initial and final stages. It has been shown that the melt flow structures strongly differ at various crucible rotation rates and at decreasing the melt depth, which results in quite specific behavior of crystallization characteristics. The computations explained physical reasons of experimentally observed unstable crystal growth at the stage of upper cone formation.
机译:已经对CZ Si_(1-x)Ge_x生长期间坩埚旋转对结晶速率行为的影响进行了数值研究,涉及生长的几个晶体位置,包括初始和最终阶段。已经显示出,熔体流动结构在各种坩埚旋转速率和减小的熔体深度下有很大的不同,这导致非常特殊的结晶特性。该计算解释了在上锥体形成阶段实验观察到的不稳定晶体生长的物理原因。

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