Low-temperature synthesis of C_60 thin films byionized cluster beam depositon technique

Xiangrong Zou; Sha Zhu; Junqing Xie

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Low-temperature synthesis of C_60 thin films byionized cluster beam depositon technique

机译：电离簇束沉积技术低温合成C_60薄膜

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C_60 filsm on Si(1 1 1) have been grown at low substrte temeprature of 100 deg C byionized clsuter beam depostion techqiue. Fourier transform infrared (FTIR) transmssion spectroscopy, Raman measurements and X-ray diffraciton are employed to investigate the strcutre of depositked films. The results show that the acceleration voltage playes an important role in the grwoth of the films. As the acceleration voltage is moderate (～100 V), a prisine C_60 film with face-centrered-cubic (fcc) crystal strcuture can be grown. Furthe increase of the acceleration voltage leads to the formation of amorophous crbon (a-C) in the grown films. When the acceleration voltage is increased to 600 V, the deposited film has a complkete amoprhous carbon (a-C) structure.

机译：Si（1 1 1）上的C_60膜已在100℃下通过离子化离子束钝化技术在较低的温度下生长。傅里叶变换红外（FTIR）透射光谱，拉曼测量和X射线衍射被用来研究沉积膜的弹纹。结果表明，加速电压在薄膜的生长中起着重要的作用。当加速电压适中（约100 V）时，可以生长出具有面心立方（fcc）晶体结构的C_60膜。进一步地，加速电压的增加导致在生长的膜中形成非晶体cr（a-C）。当加速电压增加到600 V时，沉积膜具有完整的非碳（a-C）结构。

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来源
《Journal of Crystal Growth》 |1999年第4期|p.441-445|共5页
作者
Xiangrong Zou; Sha Zhu; Junqing Xie;
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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
原文格式 PDF
正文语种 eng
中图分类晶体学;
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2. Low energy cluster beam deposition technique: Development and depositionof cluster assembled Sb thin films [J] . Prasad GVR, Patel BK, Chakravarty S, Current Science: A Fortnightly Journal of Research . 2001,第2期

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3. Low energy cluster beam deposition technique: Development and deposition of cluster assembled Sb thin films [J] . Behera S. N., Chakravarty S., Mythili R., Current science . 2001,第02期

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4. Preparation of C_60 single crystalline thin film by ionized cluster beam deposition and ion implantation into single crystalline C_60 thin film [C] . Satoru Isoda, Hiroaki Kawakubo, Satoshi Nishikawa, Symposium J on correlated effects in atomic and cluster ion bombardment and implantation;Symposium C on pushing the limits of ion beam processing - from engineering to atomic scale issues;Symposium H on advanced deposition processes and characterization of protective coatings . 1996

机译：通过电离簇束沉积和离子注入到单晶C_60薄膜中的C_60单晶薄膜的制备
5. Studies on Magnetic Thin Films Prepared by Ionized Cluster Beam Technique [D] . Kondo, Naoto 1985

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8. Photoionized Cluster Beams 1. Inter- and Intramolecular Reactivity 2. Generation of Superconducting Thin Films. [R] . Garvey, J. F. 1991

机译：光电离簇光束1.分子间和分子内反应性2.超导薄膜的产生。

Low-temperature synthesis of C_60 thin films byionized cluster beam depositon technique

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