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首页> 外文期刊>Journal of Crystal Growth >MBE growth of vertical-cavity surface-emitting laser structure without real-time monitoring
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MBE growth of vertical-cavity surface-emitting laser structure without real-time monitoring

机译:无需实时监控的垂直腔面发射激光器结构的MBE生长

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摘要

Evaluation of producing a vertical-cavity surface-emitting laser (VCSEL) epitaxial structure by molecualr beam epitaxy (MBE) without resorting to any real-time monitoring technqiue is reported. Continuous grading of Al_xGa_1-xAs between x=0.12 to x=0.92 was simply achieved by changing the Al and Ga cell temepratures in no more than three steps per DBR period. Highly uniform DBR and VCSEL structures were demosnrated with a multi-wafer MBE system. Run-to-run standard deviation of reflectance spectrum center wavelength was 0.5/100 and 1.4/100 for VCSEL etalon wavelength.
机译:报道了通过分子束外延(MBE)生产垂直腔表面发射激光器(VCSEL)外延结构的评估,而无需借助任何实时监测技术。简单地通过在每个DBR周期内以不超过三步的方式更改Al和Ga电池的特性,就可以在x = 0.12到x = 0.92之间对Al_xGa_1-xAs进行连续分级。高度均匀的DBR和VCSEL结构已通过多晶片MBE系统进行了去除。 VCSEL标准具波长的反射光谱中心波长的逐项标准偏差为0.5 / 100和1.4 / 100。

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