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首页> 外文期刊>Journal of Crystal Growth >Three-dimensional phase field simulation for surface roughening of heteroepitaxial films with elastic anisotropy
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Three-dimensional phase field simulation for surface roughening of heteroepitaxial films with elastic anisotropy

机译:具有弹性各向异性的异质外延膜表面粗糙化的三维相场模拟

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The phase field methods have been employed to study the surface roughening of heteroepitaxial films with cubic elastic anisotropy in three dimensions during the annealing process. And the stress field for an arbitrarily-shaped surface has been simultaneously solved using the phase field microelasticity model. Our simulations reveal that the self-organized surface morphologies are strongly dependent on the elastic anisotropy. It is interesting to note that one can obtain favorable surface morphologies via selection of appropriate epitaxial orientations combined with tuning the strength of elastic anisotropy or modifying the asymmetric strains induced by lattice mismatches between the epitaxial materials and substrates. (c) 2005 Elsevier B.V. All rights reserved.
机译:相场法已被用于研究退火过程中三维立体各向异性的异质外延薄膜的表面粗糙化。使用相场微弹性模型同时求解了任意形状表面的应力场。我们的模拟表明,自组织的表面形态在很大程度上取决于弹性各向异性。有趣的是,人们可以通过选择适当的外延取向并调整弹性各向异性的强度或修改由外延材料和衬底之间的晶格失配引起的不对称应变来获得良好的表面形态。 (c)2005 Elsevier B.V.保留所有权利。

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