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Characterisation of epitaxial TiO_2 thin films grown on MgO(001) using atomic layer deposition

机译:利用原子层沉积表征在MgO(001)上生长的外延TiO_2薄膜

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Thin films of TiO_2 have been deposited onto MgO(001) substrates using atomic layer deposition at 300℃. Plan and cross-sectional transmission electron microscopy (TEM), X-ray diffraction and atomic force microscopy have been used to understand the nature of the films. X-ray and electron diffraction showed that a polycrystalline, epitaxial anatase film was produced. The c-axis of the anatase was parallel to the MgO(001) surface with two orientational variants at right angles to each other in the plane of the film, each aligned with an MgO cube axis. Plan-view and cross-sectional TEM showed that the grain structure of the film reflected this orientation relationship, with the grain morphology comprising two sets of roughly tetragonal grains. Also present was a small fraction of equiaxed, anatase grains which were randomly oriented. Roughness measurement using atomic force microscopy showed that the epitaxial anatase films were quite smooth, in comparison to equivalent non-aligned films grown on silicon.
机译:TiO_2薄膜已在300℃下通过原子层沉积法沉积在MgO(001)衬底上。平面和截面透射电子显微镜(TEM),X射线衍射和原子力显微镜已用于了解薄膜的性质。 X射线和电子衍射表明产生了多晶外延锐钛矿膜。锐钛矿的c轴平行于MgO(001)表面,在薄膜的平面中彼此成直角,具有两个定向变体,每个变体与MgO立方轴对齐。平面图和横截面TEM显示,膜的晶粒结构反映了这种取向关系,其晶粒形态包括两组大致为四边形的晶粒。还存在一小部分随机定向的等轴锐钛矿晶粒。使用原子力显微镜的粗糙度测量结果表明,与在硅上生长的等效非取向膜相比,外延锐钛矿膜非常光滑。

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