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Simulation of GaN and InGaN p-i-n and n-i-n photo-devices

机译:GaN和InGaN p-i-n和n-i-n光电器件的仿真

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摘要

Gallium nitride (GaN) and related materials have attracted an intense interest in their potential applications in high-power switching, high-temperature, and high-frequency device applications. A major advantage of the GaN system for optical applications is that the energy band gap can be reduced by alloying with InN. The InGaN alloy can provide a coverage from the near UV to the near infrared, including the visible spectrum. This research will provide the photonic and electrical properties of InGaN photo-devices by simulation. GaN and InGaN photo-devices, such as p-i-n and n-i-n devices, were simulated using ATHENA and ATLAS developed by Silvaco International, Inc. The spectral-responsivity and the dark current were evaluated. These simulation results are comparable to the experimental result by Kung et al. with a 400 x 400 um mesa structure of p-i-n GaN (SPIE 3287 (1998) 214). Since the heavily p-doping is still relatively hard to achieve currently, n-i-n photo-devices are evaluated and compared to p-i-n devices.
机译:氮化镓(GaN)和相关材料对其在高功率开关,高温和高频设备应用中的潜在应用引起了浓厚的兴趣。用于光学应用的GaN系统的主要优点是可以通过与InN合金化来减少能带隙。 InGaN合金可以提供从近紫外到近红外的覆盖范围,包括可见光谱。这项研究将通过仿真提供InGaN光电器件的光子和电学特性。使用Silvaco International,Inc.开发的ATHENA和ATLAS对GaN和InGaN光电器件(例如p-i-n和n-i-n器件)进行了仿真。对光谱响应度和暗电流进行了评估。这些模拟结果与Kung等人的实验结果相当。具有p-i-n GaN的400 x 400 um台面结构(SPIE 3287(1998)214)。由于目前仍然很难实现高浓度的p掺杂,因此需要评估n-i-n光电器件并将其与p-i-n器件进行比较。

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