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机译:射频磁控溅射纳米晶SrTiO_3薄膜的表征及漏电流密度
Department of Mechanical Engineering, National Kaohsiung University of Applied Sciences, 415 Chien-Kung Road, Kaohsiung, 80782, Taiwan;
A1. X-ray diffraction; A2. natural crystal growth; A3. polycrystalline deposition; B1. nanomaterials; B2. dielectric materials; B3. DRAM capacitor;
机译:射频磁控溅射制备Ba(Sn_xTi_(1-x))O_3薄膜的介电性能和漏电流表征
机译:射频平面磁控溅射单域BiFeO_3薄膜中由SrTiO_3(001)衬底引起的晶格畸变的影响
机译:射频磁控溅射在不同衬底温度下沉积的SrTiO_3薄膜的光学性质
机译:反应射频磁控溅射制备的氧化镍薄膜的特征
机译:射频磁控溅射砷化镓薄膜的光学表征。
机译:射频直流和射频叠加直流磁控溅射沉积的透明导电掺铝ZnO多晶薄膜的载流子输运和晶体学取向特征
机译:反应射频磁控溅射制备的氧化镍薄膜的特征