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机译:使用新的化学溶液沉积方法在不进行后退火的情况下低温制备Pb(Zr_(0.52)Ti_(0.48))O_3薄膜
School of Microelectronics and Solid-State Electronics, University of Electronic Science and Technology of China, North Jianshe Road, Chengdu 610054, PR China;
A1. solid state reaction; A3. chemical solution deposition; B2. ferroelectric materials;
机译:通过基板与Pb(Zr_(0.52)Ti_(0.48))O_3膜之间的热膨胀失配来控制应力的Pb(Zr_(0.52)Ti_(0.48))O_3厚膜
机译:改善溅射PB_(1.10)的电性能(Zr_(0.52),Ti_(0.48))O_3 / PB_(1.25)(Zr_(0.52),Ti_(0.48))O_3多层薄膜
机译:CoFe_2O_4 / Pb(Zr_(0.52)Ti_(0.48))O_3 2-2-型双层薄膜中Pb(Zr_(0.52)Ti_(0.48))O_3相变的原位X射线衍射分析
机译:PB(Zr_(0.52)TI_(0.48))O_3通过脉冲激光沉积在镍基材上生长的o_3薄膜
机译:图案化的Pb(Zr0.52Ti 0.48)O3薄膜的可靠性和老化。
机译:控制性沉积条件下Pb(Zr0.52Ti0.48)O3薄膜的压电响应和玻璃上的纳米片缓冲层
机译:BifeO3 / Pb(Zr0.52Ti0.48)渗出电流性能的铁电,渗漏液通过化学溶液沉积制备的O3Multilayer薄膜