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首页> 外文期刊>Journal of Crystal Growth >In_(0.25)Ga_(0.75)As growth on low-temperature thin buffer layers formed on GaAs (001) substrate
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In_(0.25)Ga_(0.75)As growth on low-temperature thin buffer layers formed on GaAs (001) substrate

机译:在GaAs(001)衬底上形成的低温薄缓冲层上生长In_(0.25)Ga_(0.75)As

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摘要

High-quality In_(0.25)Ga_(0.75)As films were grown on low-temperature (LT) ultra-thin GaAs buffer layers formed on GaAs (001) substrate by molecular beam epitaxy. The epilayers were studied by atomic force microscopy (AFM), photoluminescence (PL) and double crystal X-ray diffraction (DCXRD). All the measurements indicated that LT thin buffer layer technique is a simple but powerful growth technique for heteroepitaxy.
机译:通过分子束外延在形成于GaAs(001)衬底上的低温(LT)超薄GaAs缓冲层上生长高质量的In_(0.25)Ga_(0.75)As薄膜。通过原子力显微镜(AFM),光致发光(PL)和双晶X射线衍射(DCXRD)研究了外延层。所有测量结果表明,LT薄缓冲层技术是一种简单但功能强大的异质外延生长技术。

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