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机译:在GaAs(001)衬底上形成的低温薄缓冲层上生长In_(0.25)Ga_(0.75)As
Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, People's Republic of China;
A1. dislocation; A1. interfaces; A1. strain; A3. molecular beam epitaxy; B2. semiconductor Ⅲ-Ⅴ materials;
机译:低温薄缓冲层对在GaAs(001)衬底上生长的In_(0.25)Ga_(0.75)As应变适应的影响
机译:霍尔和光致发光研究对In_(0.15)Ga_(0.85)As / Al_(0.25)Ga_(0.75)As / GaAs高电子迁移率中心处附加In_(0.3)Ga_(0.7)As层的厚度的影响晶体管
机译:在具有超薄非晶In_(0.6)Ga_(0.4)As缓冲层的GaAs衬底上生长的In-(0.3)Ga_(0.7)As质量得到提高的薄膜
机译:作为/ IN_(0.5)GA_(0.25)的临界层厚度研究在GaAs基板上生长的假形谐振隧道二极管结构,如/ in_(0.5)AS / IN_(0.5)AL_(0.5)
机译:GeSxSe1-x(x = 0,0.25,0.5,0.75,1)单晶的生长和表征。
机译:GaAs(001)上生长的高质量100 nm厚InSb膜具有InxAl1-xSb连续渐变缓冲层的基板
机译:Gaas(001)衬底上的薄Inas膜和Gasb缓冲层