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首页> 外文期刊>Journal of Heat Transfer >Measurement Of The Thermal Conductivity And Heat Capacity Of Freestanding Shape Memory Thin Films Using The 3ω Method
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Measurement Of The Thermal Conductivity And Heat Capacity Of Freestanding Shape Memory Thin Films Using The 3ω Method

机译:使用3ω方法测量独立式形状记忆薄膜的热导率和热容量

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摘要

An accurate measurement of the thermophysical properties of freestanding thin films is essential for modeling and predicting thermal performance of microsystems. This paper presents a method for simultaneous measurement of in-plane thermal conductivity and heat capacity of freestanding thin films based on the thermal response to a sinusoidal electric current. An analytical model for the temperature response of a freestanding thin film to a sinusoidal heating current passing through a metal heater patterned on top of the thin film is derived. Freestanding thin-film samples of silicon nitride and nickel titanium (NiTi), a shape memory alloy, are microfabricated and characterized. The thermal conductivity of thin-film NiTi, which increases linearly between 243 K and 313 K, is 40% lower than the bulk value at room temperature. The heat capacity of NiTi also increases linearly with temperature in the low temperature phase and is nearly constant above 280 K. The measurement technique developed in this work is expected to contribute to an accurate thermal property measurement of thin-film materials. Thermophysical measurements on NiTi presented in this work are expected to aid in an accurate thermal modeling of microdevices based on the shape memory effect.
机译:精确测量独立式薄膜的热物理性质对于建模和预测微系统的热性能至关重要。本文提出了一种基于对正弦电流的热响应同时测量独立式薄膜的面内热导率和热容的方法。推导了独立式薄膜对通过在薄膜顶部构图的金属加热器的正弦加热电流的温度响应的分析模型。微型制造并表征了氮化硅和形状记忆合金镍钛(NiTi)的独立薄膜样品。薄膜NiTi的热导率在243 K和313 K之间线性增加,比室温下的体积值低40%。在低温阶段,NiTi的热容量也随温度线性增加,并且在280 K以上时几乎保持恒定。这项工作中开发的测量技术有望对薄膜材料的热性能进行精确测量。预期这项工作中提出的NiTi的热物理测量将有助于基于形状记忆效应的微型器件的精确热建模。

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