Critical Heat Flux of R-123 in Silicon-Based Microchannels

Ali Kosar; Yoav Peles

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Critical Heat Flux of R-123 in Silicon-Based Microchannels

机译：硅基微通道中R-123的临界热通量

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摘要

Critical heat flux (CHF) of R-123 in a silicon-based microchannel heat sink was investigated at exit pressures ranging from 227 kPa to 520 kPa. Critical heat flux data were obtained over effective heat fluxes ranging from 53 W/cm~2 to 196 W/cm~2 and mass fluxes from 291 kg/m~2 s to 1118 kg/m~2 s. Flow images and high exit qualities suggest that dry out is the leading CHF mechanism. The effect of mass velocity, exit quality, and system pressure were also examined, and a new correlation is presented to represent the effect of these parameters.

机译：在出口压力为227 kPa至520 kPa的情况下，研究了硅基微通道散热器中R-123的临界热通量（CHF）。在有效热通量范围为53 W / cm〜2至196 W / cm〜2和质量通量范围为291 kg / m〜2 s至1118 kg / m〜2 s的情况下，获得了关键的热通量数据。流动图像和高出口质量表明，变干是主要的CHF机制。还检查了质量速度，出口质量和系统压力的影响，并提出了一种新的相关性来表示这些参数的影响。

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来源
《Journal of Heat Transfer》 |2007年第7期|844-851|共8页
作者
Ali Kosar; Yoav Peles;
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作者单位

Department of Mechanical, Aerospace and Nuclear Engineering, Rensselaer Polytechnic Institute, Troy, NY 12180;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);
原文格式 PDF
正文语种 eng
中图分类热力工程、热机;
关键词
critical heat flux; boiling; microchannels; flow pattern; MEMS;

机译：临界热通量;沸腾;微通道;流型微机电系统;

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Critical Heat Flux of R-123 in Silicon-Based Microchannels

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