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首页> 外文期刊>Journal of Heat Transfer >Observation of Femtosecond Laser-Induced Ablation in Crystalline Silicon
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Observation of Femtosecond Laser-Induced Ablation in Crystalline Silicon

机译:飞秒激光诱导晶体硅烧蚀的观察

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摘要

The ablation of crystalline silicon by ultrashort laser pulses is studied experimentally. A pump-and-probe experiment is implemented in a collinear arrangement, utilizing a time-delayed frequency-doubled probe beam for in situ reflectance measurement and ultrafast microscopy observation. Enhanced surface reflectivity in sub-picosecond time scale at the center of the irradiated spot indicates nonthermal liquid layer formation. A short-lived nonthermal liquid phase was detected at fluence of 1.5 J/cm~2. In addition to this observation, the reflected images for pump beam fluences ranging from 1.5 to 4.6 J/cm~2 provide evidence of plasma expansion above the irradiated target.
机译:实验研究了超短激光脉冲对晶体硅的烧蚀。以共线方式实施泵浦和探针实验,利用时延倍频探针束进行原位反射率测量和超快速显微镜观察。在亚皮秒级的时间范围内,在受辐照点的中心处增强的表面反射率指示非热液层的形成。在1.5 J / cm〜2的注量下检测到短寿命的非热液相。除此观察外,泵浦光束通量在1.5至4.6 J / cm〜2范围内的反射图像还提供了等离子体在被照射目标上方膨胀的证据。

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