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首页> 外文期刊>Journal of Materials Engineering and Performance >Relationship Between Crystalline Structure and Hardness of Ti-Si-N-O Coatings Fabricated by dc Sputtering
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Relationship Between Crystalline Structure and Hardness of Ti-Si-N-O Coatings Fabricated by dc Sputtering

机译：直流溅射制备Ti-Si-N-O涂层的晶体结构与硬度的关系

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摘要

Ti-Si-N-O coatings were deposited on AISI D2 tool steel and silicon substrates by dc reactive magnetron co-sputtering using a target of Ti-Si with a constant area ratio of 0.2. The substrate temperature was 400 °C and reactive atmosphere of nitrogen and argon. For all samples, argon flow was maintained constant at 25 sccm, while the flow of the nitrogen was varied to analyze the structural changes related to chemical composition and resistivity. According to results obtained by x-ray diffraction and stoichiometry calculations by x-ray energy dispersive spectroscopy the Ti-Si-N-O coatings contain two solid solutions. The higher crystalline part corresponds to titanium oxynitrure. Hardness tests on the coatings were carried out using the indentation work model and the hardness value was determined. Finally, the values of hardness were corroborated by nanoindentation test, and values of Young’s modulus and elastic recovery were discussed. We concluded that F2TSN sample (F Ar = 25 sccm, F N = 5 sccm, P = 200 W, and P W = 8.9 × 10?3 mbar) presented the greatest hardness and the lowest resistivity values, due to its preferential crystalline orientation.
机译：Ti-Si-N-O涂层是通过直流反应磁控管共溅射法在AISI D2工具钢和硅基板上沉积的，使用的目标是Ti-Si的恒定面积比为0.2。基板温度为400℃，并且反应气氛为氮气和氩气。对于所有样品，氩气流量保持恒定在25 sccm，同时改变氮气流量以分析与化学成分和电阻率相关的结构变化。根据通过X射线衍射和通过X射线能量色散光谱计算的化学计量获得的结果，Ti-Si-N-O涂层包含两种固溶体。较高的结晶部分对应于氮氧化钛。使用压痕工作模型对涂层进行硬度测试，并确定硬度值。最后，通过纳米压痕试验证实了硬度值，并讨论了杨氏模量和弹性回复率。我们得出的结论是，F2TSN样品（F Ar = 25 sccm，FN = 5 sccm，P = 200 W和PW = 8.9×10？3 mbar）呈现出由于其优先的晶体取向，因此具有最大的硬度和最低的电阻率值。

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