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A multiscale study of misfit dislocations in PbTe/PbSe(001) heteroepitaxy

机译:PbTe / PbSe(001)异位错配位错的多尺度研究

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摘要

In this work, we investigate misfit dislocations in PbTe/PbSe heteroepitaxial systems using the concurrent atomistic-continuum (CAC) method. A potential model containing the long-range Coulombic interaction and short-range Buckingham potential is developed for the system. By considering the minimum potential energy of relaxed interface structures for various initial conditions and PbTe layer thicknesses, the equilibrium structure of misfit dislocations and the dislocation spacings in PbTe/PbSe(001) heteroepitaxial thin films are obtained as a function of the PbTe layer thicknesses grown on a PbSe substrate. The critical layer thickness above which misfit dislocations inevitably form, the structure of the misfit dislocations at the interfaces, and the dependence of average dislocation spacing on PbTe layer thickness are obtained and discussed. The simulation results provide an explanation for the narrowing of the spread of the distribution of misfit dislocation spacing as layer thickness increases in PbTe/PbSe(001) heteroepitaxy.
机译:在这项工作中,我们使用并发原子连续体(CAC)方法研究PbTe / PbSe异质外延系统中的失配位错。为该系统开发了一个包含远程库仑相互作用和短距离白金汉势的势模型。通过考虑各种初始条件和PbTe层厚度的弛豫界面结构的最小势能,获得了失配位错的平衡结构和PbTe / PbSe(001)异质外延薄膜中的位错间距,作为生长的PbTe层厚度的函数在PbSe衬底上。获得并讨论了在其上不可避免地形成失配位错的临界层厚度,界面处失配位错的结构以及平均位错间距对PbTe层厚度的依赖性。仿真结果提供了随着层厚度在PbTe / PbSe(001)异质外延中错配位错间距分布范围变窄的解释。

著录项

  • 来源
    《Journal of Materials Research》 |2019年第13期|2306-2314|共9页
  • 作者单位

    Univ Florida, Dept Mech & Aerosp Engn, Gainesville, FL 32611 USA;

    Univ Utah, Dept Chem, Salt Lake City, UT 84112 USA;

    Univ Florida, Dept Mech & Aerosp Engn, Gainesville, FL 32611 USA;

    Georgia Inst Technol, Woodruff Sch Mech Engn, Atlanta, GA 30332 USA|Georgia Inst Technol, Sch Mat Sci & Engn, Atlanta, GA 30332 USA;

    Univ Florida, Dept Mech & Aerosp Engn, Gainesville, FL 32611 USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    epitaxy; dislocations; simulation;

    机译:外延;位错;模拟;

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