机译:109°畴图案化BiFeO_3薄膜中结构畸变的原子映射
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences,Shenyang 110016, China and Science and Technology on Surface Physics and Chemistry Laboratory, 621908 Jiangyou, Sichuan, China;
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences,Shenyang 110016, China;
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences,Shenyang 110016, China;
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences,Shenyang 110016, China;
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences,Shenyang 110016, China;
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences,Shenyang 110016, China and School of Materials Science and Engineering, Lanzhou University of Technology,730050 Lanzhou, China;
机译:109°畴的BiFeO_3薄膜的光伏性能
机译:多铁性BiFeO_3薄膜中与厚度有关的109°畴演化
机译:晶体畸变和畴结构对BiFeO_3薄膜压电性能的影响
机译:在功能硅衬底表面上制备带图案的BiFeO_3薄膜
机译:原子力显微镜研究的聚苯乙烯-聚(甲基丙烯酸甲酯)二嵌段共聚物薄膜中圆柱纳米域的表征
机译:高整流比大于109的透明CuI / ZnO异质结的碘化铜薄膜的室温畴外延
机译:外延薄膜域X射线布拉格投影PTYCHOGE的结构敏感性