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Deformation-mechanism dependent stretchability of nanocrystalline gold films on flexible substrates

机译：变形机制取决于柔性基板上纳米晶金膜的可拉伸性

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摘要

Stretchability of polyimide-supported nanocrystalline Au films with a thickness ranging from 930 to 20 nm was evaluated by uniaxial tensile testing. The results show that the fracture strain gradually decreased with decreasing the film thickness. Such degraded stretchability depends on plastic deformation mechanisms associated with the length scales. As the film thickness is larger than 90 nm, local thinning in the grown grains contributed to the high stretchability. Full dislocation behaviors including dislocation pileup in the 930 nm-thick film, the activation of Frank-Read dislocation source in the 170 nm-thick film and the grain boundary dislocation source in the 90 nm-thick film were dominated plastic deformation. As the film thickness is less than 40 nm, low stretchability of thin films resulted from intergranular fracture, and partial dislocation behaviors became prevailed. Evident grain growth happened in the films studied except for the 20 nm-thick film, which is expected to be involved in the stretchability of the nanocrystalline metal films on flexible substrates.
机译：通过单轴拉伸试验评价厚度为930nm至20nm的聚酰亚胺负载的纳米晶体Au膜的可拉伸性。结果表明，随着薄膜厚度的减小，断裂应变逐渐减小。这种降低的拉伸性取决于与长度标尺相关的塑性变形机制。当膜厚度大于90nm时，生长晶粒中的局部变薄有助于高拉伸性。完整的位错行为包括在930 nm厚的薄膜中的位错堆积，在170 nm厚的薄膜中的Frank-Read位错源的激活以及在90 nm厚的薄膜中的晶界位错源的塑性变形。当膜厚度小于40nm时，由于晶间断裂导致薄膜的低拉伸性，并且普遍存在部分位错行为。除了20 nm厚的薄膜外，研究的薄膜中均出现明显的晶粒长大，该薄膜有望参与柔性基板上纳米晶金属薄膜的拉伸性。

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  • 来源
    《Journal of Materials Research》 |2017年第18期|3516-3523|共8页
  • 作者

    Xue-Mei Luo; Guang-Ping Zhang;

  • 作者单位

    Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, People's Republic of China;

    Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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