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Band engineering of type-II ZnO/ZnSe heterostructures for solar cell applications

机译:用于太阳能电池的II型ZnO / ZnSe异质结构的能带工程

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摘要

Two kinds of type-II heterostructures (HSs) of ZnO (wurtzite)/ZnSe (wurtzite) [ZnO (WZ)/ZnSe (WZ)] and ZnO (wurtzite)/ZnSe (zinc blende) [ZnO (WZ)/ZnSe (ZB)] were designed for photovoltaic applications by first-principle calculations. The calculated effective bandgap of 1.51 eV for the ZnO (WZ)/ZnSe (WZ) HS is more favorable for solar cell applications compared to that of 1.69 eV for the ZnO (WZ)/ZnSe (ZB) HS. Furthermore, the electrons and holes are more effectively separated at the interface of ZnO (WZ)/ZnSe (WZ) HS due to the stronger misfit stress field. Finally, a strained ZB ZnSe layer was introduced to transport the separated holes from WZ ZnSe layer, and an optimal structure of ZnO (WZ)/ZnSe (WZ)/ZnSe (ZB) was proposed to realize a solar cell with near-infrared response.
机译:ZnO(纤锌矿)/ ZnSe(纤锌矿)[ZnO(WZ)/ ZnSe(WZ)]和ZnO(纤锌矿)/ ZnSe(锌共混物)[ZnO(WZ)/ ZnSe( ZB)]是根据第一原理计算设计的,用于光伏应用。与ZnO(WZ)/ ZnSe(ZB)HS的1.69 eV相比,所计算的ZnO(WZ)/ ZnSe(WZ)HS的有效带隙为1.51 eV更有利于太阳能电池应用。此外,由于较强的失配应力场,电子和空穴在ZnO(WZ)/ ZnSe(WZ)HS的界面处更有效地分离。最后,引入应变的ZB ZnSe层以传输从WZ ZnSe层分离出的空穴,并提出了ZnO(WZ)/ ZnSe(WZ)/ ZnSe(ZB)的最佳结构以实现具有近红外响应的太阳能电池。

著录项

  • 来源
    《Journal of Materials Research》 |2012年第4期|p.730-733|共4页
  • 作者单位

    Fujian Key Laboratory of Semiconductor Materials and Applications, Department of Physics, Xiamen University, Xiamen 361005, People's Republic of China;

    Fujian Key Laboratory of Semiconductor Materials and Applications, Department of Physics, Xiamen University, Xiamen 361005, People's Republic of China;

    Fujian Key Laboratory of Semiconductor Materials and Applications, Department of Physics, Xiamen University, Xiamen 361005, People's Republic of China;

    Fujian Key Laboratory of Semiconductor Materials and Applications, Department of Physics, Xiamen University, Xiamen 361005, People's Republic of China;

    Fujian Key Laboratory of Semiconductor Materials and Applications, Department of Physics, Xiamen University, Xiamen 361005, People's Republic of China;

    Fujian Key Laboratory of Semiconductor Materials and Applications, Department of Physics, Xiamen University, Xiamen 361005, People's Republic of China;

    Fujian Key Laboratory of Semiconductor Materials and Applications, Department of Physics, Xiamen University, Xiamen 361005, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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