• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Journal of Materials Research >Highly wear resistant chemisorbed polar ultra-high-molecular-weight polyethylene thin film on Si surface for micro-system applications
【24h】

Highly wear resistant chemisorbed polar ultra-high-molecular-weight polyethylene thin film on Si surface for micro-system applications

机译：在硅表面上具有高耐磨性的化学吸附极性超高分子量聚乙烯薄膜，适用于微系统应用

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

We report deposition and tribological studies of a chemisorbed UHMWPE (ultra-high-molecular-weight polyethylene) film on an Si surface. UHMWPE molecules containing carboxyl and hydroxyl chemical groups were chemisorbed onto an Si surface using an intermediate GPTMS SAM (glycidoxypropyltrimethoxy silane self-assembled monolayer) layer. The carboxyl and hydroxyl groups of UHMWPE molecules react with the terminal epoxy groups of GPTMS SAM during chemisorption. The resultant film (～1.4 μm thick) has shown low coefficient of friction (～0.1) and high wear life (exceeding 100,000 cycles) in a sliding test against a 4 mm diameter Si_3N_4 ball at a normal load of 0.3 N and a sliding velocity of 0.042 m/s measured on a micro-tribometer. In contrast, bare Si or GPTMS SAM modified Si has shown a higher coefficient of friction and failed within a few tens of sliding cycles. The high wear durability of the chemisorbed polymer film is attributed to the excellent adhesion of the UHMWPE film with the substrate due to chemisorption and to the good lubrication properties of UHMWPE molecules. This wear resistant film has potential applications in micro-electro-mechanical systems made of Si.
机译：我们报告了化学吸附的UHMWPE（超高分子量聚乙烯）膜在Si表面上的沉积和摩擦学研究。使用中间GPTMS SAM（环氧丙氧基丙基三甲氧基硅烷自组装单层）层将含有羧基和羟基化学基团的UHMWPE分子化学吸附到Si表面上。在化学吸附过程中，UHMWPE分子的羧基和羟基与GPTMS SAM的末端环氧基反应。在0.3 N的法向载荷和滑动速度下，在直径为4 mm的Si_3N_4球上进行滑动试验时，所得膜（〜1.4μm厚）显示出低摩擦系数（〜0.1）和高磨损寿命（超过100,000个循环）在微摩擦计上测得的值为0.042 m / s。相反，裸露的Si或GPTMS SAM改性的Si表现出较高的摩擦系数，并且在几十个滑动循环内失效。化学吸附的聚合物薄膜的高耐磨性归因于UHMWPE薄膜由于化学吸附而与基材的出色粘合性以及UHMWPE分子的良好润滑性能。这种耐磨膜在由Si制成的微机电系统中具有潜在的应用。

著录项

  • 来源
    《Journal of Materials Research》 |2009年第11期|3331-3337|共7页
  • 作者

    Nalam Satyanarayana; Sujeet K. Sinha; Seh-Chun Lim;

  • 作者单位

    Department of Mechanical Engineering, National University of Singapore, Singapore 117576;

    Department of Mechanical Engineering, National University of Singapore, Singapore 117576;

    Department of Mechanical Engineering, National University of Singapore, Singapore 117576;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号