• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Journal of Materials Research >Microstructures, surface areas, and oxygen absorption of Ti and Ti-Zr-V films grown using glancing-angle sputtering
【24h】

Microstructures, surface areas, and oxygen absorption of Ti and Ti-Zr-V films grown using glancing-angle sputtering

机译：掠射角溅射生长的Ti和Ti-Zr-V薄膜的微观结构，表面积和氧吸收

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Highly porous Ti and TiZrV getter film coatings have been successfully grown on (100) silicon substrates using the glancing-angle direct-current magnetron sputtering method. The evolution of the microstructures of the Ti and the TiZrV films strongly depends on the sputtering flux rate, surface diffusion rate, nucleation rate, compositions, and self-shadowing geometry of the nuclei on the sputtering flux. The larger the glancing angle, the higher the porosity and specific surface area of the Ti and TiZrV films. The weight-gain results strongly depend on several factors, such as specific surface area, the surface structure of the getter film, the diffusion rate of O in the getter film, the reactivity of Ti, Zr, and V on O, and the order of the stabilities of Ti, Zr, and V oxides on the film's surface. Porous Ti film absorbs oxygen better than porous TiZrV film does due to its higher surface area and the high diffusion rate of O in Ti films.
机译：使用掠射角直流磁控溅射方法已成功在（100）硅基板上生长了高度多孔的Ti和TiZrV吸气剂薄膜涂层。 Ti和TiZrV薄膜的微观结构的演变在很大程度上取决于溅射通量速率，表面扩散速率，成核速率，组成以及溅射通量上原子核的自阴影几何形状。掠射角越大，Ti和TiZrV膜的孔隙率和比表面积越高。重量增加的结果很大程度上取决于几个因素，例如比表面积，吸气膜的表面结构，O在吸气膜中的扩散速率，Ti，Zr和V在O上的反应性以及顺序膜表面上Ti，Zr和V氧化物的稳定性多孔的Ti膜比多孔的TiZrV膜吸收氧气更好，这是因为其表面积更大且O在Ti膜中的扩散速率很高。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号