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Enhanced tensile ductility in an electrodeposited nanocrystalline copper

机译:电沉积纳米晶铜中增强的拉伸延展性

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摘要

A fully dense nanocrystalline (nc) Cu with mean grain size of 72 nm and a broad grain size distribution was synthesized by electrodeposition. Uniaxial tensile tests were done at different strain rates and room temperature. A very high strength of 1.04 G was obtained at strain rate of 0.1 s~(-1). The nearly perfect plasticity with a large strain of close to 20% was displayed at specific low strain rates of 4 × 10~(-5) to 10~(-4) s~(-1). With increasing strain rate, the nearly perfect plasticity disappeared. Strain rate sensitivity and activation volume of the nc Cu were estimated from the flow stress at a fixed strain of 1% and a strain rate change (jump) test. It was deduced from the high strain rate sensitivity exponent of 0.08 and small activation volume of 12b~3 that both dislocation and grain boundary activities would take place in this nc Cu, which explained the nearly perfect plasticity observed in the tensile test.
机译:通过电沉积合成了平均晶粒尺寸为72 nm且晶粒分布宽的完全致密的纳米晶(nc)Cu。在不同的应变速率和室温下进行了单轴拉伸试验。在0.1 s〜(-1)的应变速率下获得了非常高的1.04 G强度。在4×10〜(-5)到10〜(-4)s〜(-1)的特定低应变率下,具有接近20%的大应变的近乎完美的可塑性。随着应变率的增加,几乎完美的可塑性消失了。根据固定应力为1%时的流动应力和应变率变化(跳跃)测试,可以估算nc Cu的应变率敏感性和激活体积。由0.08的高应变速率敏感性指数和12b〜3的小活化体积推论出,在该nc Cu中会发生位错和晶界活性,这解释了在拉伸试验中观察到的近乎完美的可塑性。

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