Metal coatings on SiC nanowires by plasma-enhanced chemical vapor deposition

Aaron D. LaLonde; M. Grant Norton; David N. Mcllroy

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Metal coatings on SiC nanowires by plasma-enhanced chemical vapor deposition

机译：通过等离子体增强化学气相沉积在SiC纳米线上的金属涂层

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Coating of nanowires is being investigated to broaden potential uses for future applications. Coatings of Ni and Pt nanoparticles have been synthesized on silicon carbide nanowires by plasma enhanced chemical vapor deposition. Coatings with high particle densities with average particle diameters of 2.76 and 3.28 nm for Pt and Ni, respectively, were formed with narrow size distributions. Plasma enhanced chemical vapor deposition appears to be an efficient method for production of metal coatings on nanowires.

机译：正在研究纳米线的涂层，以拓宽未来应用的潜在用途。 Ni和Pt纳米粒子的涂层已通过等离子增强化学气相沉积法在碳化硅纳米线上合成。形成具有高粒度的涂层，其Pt和Ni的平均粒径分别为2.76和3.28 nm，且粒径分布较窄。等离子体增强化学气相沉积似乎是在纳米线上生产金属涂层的有效方法。

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《Journal of Materials Research》 |2005年第3期|p.549-553|共5页
作者
Aaron D. LaLonde; M. Grant Norton; David N. Mcllroy;
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作者单位

School of Mechanical and Materials Engineering, Washington State University, Pullman, Washington 99164-2920;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
原文格式 PDF
正文语种 eng
中图分类工程材料学;
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1. Amorphous silicon carbide thin films (a-SiC:H) deposited by plasma-enhanced chemical vapor deposition as protective coatings for harsh environment applications [J] . W. Daves, A. Krauss, N. Behnel, Thin Solid Films . 2011,第18期

机译：通过等离子体增强化学气相沉积法沉积的非晶碳化硅薄膜（a-SiC：H）作为恶劣环境应用中的保护涂层
2. ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition [J] . Tak Y, Yong K Surface review and letters . 2005,第2期

机译：通过等离子体增强原子层化学气相沉积制备的ZrO2涂层SiC纳米线
3. Plasma-Enhanced Metal-Organic Chemical Vapor Deposition (PEMOCVD) of Catalytic Coatings for Fuel Cell Reformers [J] . Romit Dhar, Patrick D. Pedrow, KNona C. Liddell, IEEE Transactions on Plasma Science . 2005,第1期

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4. Deposition of conventional and gradient optical coatings by ECR plasma-enhanced chemical vapor deposition [C] . Pavel V. Bulkin, Rand Afrikaans Univ., Ecole Polytechnique (France), Developments in Optical Component Coatings . 1996

机译：通过ECR等离子体增强化学气相沉积法沉积常规和渐变光学涂层
5. Lattice matched III-V/group IV semiconductor heterostructures: Metalorganic chemical vapor deposition and remote plasma-enhanced chemical vapor deposition. [D] . Choi, Sungwoo. 1992

机译：晶格匹配的III-V / IV组半导体异质结构：金属有机化学气相沉积和远程等离子体增强化学气相沉积。
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Metal coatings on SiC nanowires by plasma-enhanced chemical vapor deposition

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