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Quantifying improvements in adhesion of platinum films on brittle substrates

机译:定量改善脆性基材上铂膜的附着力

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摘要

This study used nanoindentation coupled with stressed overlayers to evaluate the effect of titanium interlayers on the interfacial fracture energy of platinum films on SiO_2 substrates. Interfacial fracture energy was calculated three ways: from platinum buckles that formed spontaneously upon deposition of the film, from buckles that formed upon deposition of a stressed tungsten overlayer, and from blisters triggered by indentation of a platinum film with a tungsten stressed overlayer. The calculated values for the interfacial fracture energy of the Pt-SiO_2 interface were 0.2 and 0.5 J/m~2 for indentation blisters and spontaneous buckles, respectively. The effect of a titanium interlayer on adhesion was examined using a tungsten stressed overlayer coupled with nanoindentation. The addition of a titanium layer improved the adhesion of the platinum film on SiO_2 from 0.2 to 1.0 J/m~2.
机译:这项研究使用纳米压痕结合应力覆盖层来评估钛中间层对SiO_2基底上铂膜的界面断裂能的影响。界面断裂能的计算方法有三种:从沉积薄膜时自发形成的铂金扣环,从沉积有应力的钨上覆层时形成的扣环,以及由铂膜上带有钨的应力覆层的压痕触发的水泡。对于压痕水泡和自发屈曲,Pt-SiO_2界面的界面断裂能的计算值分别为0.2和0.5J / m〜2。钛夹层对附着力的影响使用钨压应力覆盖层和纳米压痕进行了检验。钛层的加入将铂膜在SiO_2上的附着力从0.2提高到1.0 J / m〜2。

著录项

  • 来源
    《Journal of Materials Research》 |2004年第6期|p.1818-1825|共8页
  • 作者单位

    School of Mechanical and Materials Engineering, Washington State University, Pullman, Washington 99164-2920;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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