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Determination of the anisotropic optical properties for perfluorinated vanadyl phthalocyanines thin films

机译:全氟钒基酞菁薄膜的各向异性光学性能的测定

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Thin films of perfluorinated vanadyl phthalocyanine F_(16)PcVO were prepared by physical vapor deposition in high vacuum on KBr and fused silica substrates. The absorption spectra in the visible region show that the films on different substrates have different structure. The optical constants for F_(16)PcVO films were obtained in the spectral range of 0.7-4.5 eV from the simulation of ellipsometry spectra with an anisotropic uniaxial model. From the difference between the in-plane and out-of-plane components of the extinction coefficient the average tilt angle of the F_(16)PcVO molecular planes with respect to the substrate plane was found to be 56 deg for fused silica substrates and between 0 deg and 3 deg for KBr substrates.
机译:通过在KBr和熔融石英基底上高真空物理气相沉积制备全氟化钒基酞菁F_(16)PcVO薄膜。可见光区的吸收光谱表明,不同基材上的薄膜结构不同。 F_(16)PcVO薄膜的光学常数在0.7-4.5 eV的光谱范围内,通过使用各向异性单轴模型的椭圆偏振光谱模拟获得。根据消光系数的面内和面外分量之间的差异,对于熔融石英基底,F_(16)PcVO分子平面相对于基底平面的平均倾斜角为56度,并且对于KBr基板为0度和3度。

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