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首页> 外文期刊>Journal of Materials Research >Microstructural characterization of thick YBa_2Cu_3O_(7-δ) films on improved rolling-assisted biaxially textured substrates
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Microstructural characterization of thick YBa_2Cu_3O_(7-δ) films on improved rolling-assisted biaxially textured substrates

机译：改进的轧制辅助双轴织构衬底上厚YBa_2Cu_3O_（7-δ）薄膜的微观结构表征

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摘要

The microstructural changes associated with the reduced dependence of critical current density (J_c) versus thickness of thick, epitaxial YBa_2Cu_3O_(7-δ) (YBCO) films on rolling-assisted biaxially textured substrates (RABiTS) were investigated. Pulsed laser deposited YBCO films varying in thickness from 1.0 to 6.4μm on RABiTS with an architecture of Ni-3 at.% W/Y_2O_3/yttrium-stabilized-zirconia/CeO_2/YBCO were prepared for cross-sectional transmission electron microscopy studies. Dramatic improvements in physical properties and microstructural quality were observed resulting from the use of Ni-3 at.% W substrates, which provided a sharper texture over earlier Ni substrates, and replacement of CeO_2 with Y_2O_3 as the seed layer within the buffers. The YBCO films showed exceptional orientation up to 6.4μm thickness, with no misoriented grains or dead layers observed and only limited reaction between the YBCO and CeO_2 cap layer. The high quality of the films was also attributed in part to the formation of a tungsten oxide layer forming at the top of the Ni-3% W substrate, limiting the growth of deleterious NiO into the conductor.
机译：研究了与临界电流密度（J_c）随厚度增加的外延YBa_2Cu_3O_（7-δ）（YBCO）薄膜在滚动辅助双轴织构衬底（RABiTS）上的依赖性降低相关的微观结构变化。制备了在RaBiTS上厚度为1.0到6.4μm的脉冲激光沉积的YBCO膜，其结构为Ni-3 at。％W / Y_2O_3 /钇稳定氧化锆/ CeO_2 / YBCO，用于横截面透射电子显微镜研究。观察到物理性能和微观结构质量的显着改善，这是由于使用了Ni-3 at。％W的基材，与早期的Ni基材相比，该材料提供了更清晰的质感，并且用Y_2O_3代替CeO_2作为缓冲液中的种子层。 YBCO薄膜显示出高达6.4μm厚度的出色取向，没有观察到取向错误的晶粒或死层，并且YBCO和CeO_2盖层之间的反应有限。薄膜的高质量还部分归因于在Ni-3％W衬底顶部形成的氧化钨层的形成，限制了有害NiO向导体中的生长。

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