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首页> 外文期刊>Journal of Materials Research >Comparison of hydrophilic properties of amorphous TiO_x films obtained by radio frequency sputtering and plasma-enhanced chemical vapor deposition
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Comparison of hydrophilic properties of amorphous TiO_x films obtained by radio frequency sputtering and plasma-enhanced chemical vapor deposition

机译：射频溅射和等离子增强化学气相沉积获得的非晶TiO_x膜的亲水性比较

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摘要

The hydrophilic properties of amorphous TiO_x films preparedd by different methods, e.g., radio frequency (rf) sputtering and plasma-enhanced chemical vapor deposition (PECVD), were studied. It was found that the hydrophilicity strongly depends on the film structure. The best hydrophilicity was realized with the PECVD amorphous film having distorted Ti-O bonds due to a large amount of OH groups. These characteristics of the PECVD amorphous film suggest that such a low-density film including distorted Ti-O bonds could increase the photoenhancement efficiency by ultraviolet radiation. This reason is also supported from the results that a low-density rf sputtered film presented a higher hydrophilicity compared to a high-density radio frequency sputtered film. Furthermore, both electrical and chemical effects of OH groups will also contribute to the good hydrophilicity of the PECVD film.
机译：研究了通过不同方法制备的非晶TiO_x膜的亲水特性，例如射频（rf）溅射和等离子体增强化学气相沉积（PECVD）。发现亲水性强烈取决于膜结构。由于由于大量的OH基而具有变形的Ti-O键的PECVD非晶膜实现了最佳的亲水性。 PECVD无定形膜的这些特性表明，这样的包括畸变的Ti-O键的低密度膜可以提高紫外线辐射的光增强效率。与高密度射频溅射膜相比，低密度射频溅射膜具有更高的亲水性，这一结果也得到了支持。此外，OH基团的电和化学作用也将有助于PECVD膜的良好亲水性。

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