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首页> 外文期刊>Journal of Materials Research >Characterization and optical properties of diamondlike carbon prepared by electron cyclotron resonance plasma
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Characterization and optical properties of diamondlike carbon prepared by electron cyclotron resonance plasma

机译：电子回旋共振等离子体制备的类金刚石碳的表征和光学性质

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Diamondlike carbon (DLC) films have been prepared on radio-frequency (rf) biased substrates maintained at low temperature using electron cyclotron resonance CH_4-Ar plasma. The effects of negative rf bias and reactant gas composition on the bonding structure, hardness, and resistivity of the films were systematically investigated. DLC films deposited on PMMA (polymethyl methacrylate) were examined by optical methods to determine the absorption coefficients and the optical band gap. It was found that DLC films synthesized at bias voltage of -(80--100) V and FcH_4/F_Ar of 0.075-0.086 exhibit extreme hardness of more than 3000 kgf mm~-2, high electrical resistivity up to 10~14 Ω cm, band gap larger than 2.5 eV, and excellent optical transparency. The results indicate that ECR CH_4-Ar plasma with low negative rf bias and suitable CH_4/Ar gas ratio can process optically transparent and hard protective DLC films on PMMA plastics.
机译：使用电子回旋共振CH_4-Ar等离子体在保持低温的射频（rf）偏置基板上制备了类金刚石碳（DLC）膜。系统研究了负射频偏压和反应气体组成对薄膜的键合结构，硬度和电阻率的影响。通过光学方法检查沉积在PMMA（聚甲基丙烯酸甲酯）上的DLC膜，以确定吸收系数和光学带隙。发现在-（80--100）V偏置电压和FcH_4 / F_Ar为0.075-0.086的条件下合成的DLC膜具有超过3000 kgf mm〜-2的极高硬度，高达10〜14Ωcm的高电阻率，带隙大于2.5 eV，并且具有出色的光学透明度。结果表明，具有较低的负rf偏压和合适的CH_4 / Ar气比的ECR CH_4-Ar等离子体可以在PMMA塑料上加工光学透明且坚硬的DLC保护膜。

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