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首页> 外文期刊>Journal of Materials Research >Thermally induced structural changes in epitaxial SrZrO_3 films on SrTiO)3.
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Thermally induced structural changes in epitaxial SrZrO_3 films on SrTiO)3.

机译：热诱导SrTiO）3上外延SrZrO_3薄膜的结构变化。

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摘要

Epitaxial, continuous, approximately 40-nm-thick films of SrZrO_3 on SrTiO_3, substrates prepared by a chemical solution deposition method including a post- deposition heat treatment at 900-1000 deg C were subjected to further heat treatments at higher temperatures (approximately l200-l300 deg. C) to investigate their high temperature stability. Experimental investigations included scanning electron microscopy, atomic force microscopy, and conventional transmission electron microscopy. The investigations have demonstrated a morphological instability of the films. Concentration profiles of the cations determined by energy dispersive x-ray spectroscopy, as well as investigations by x-ray diffraction, revealed that the film islands consisted of a solid solution. As shown by high-resolution electron microscopy, the reaction between film and substrate also led to an increase in the separation distance of the misfit dislocations that were introduced during the lower temperature heat treatment to relax the lattice mismatch strain. The morphological and structural changes of the films are reported and discussed in this paper.
机译：通过化学溶液沉积方法（包括在900-1000摄氏度下的沉积后热处理）在SrTiO_3上制备的SrZrO_3的外延，连续，厚度约40 nm的基板在更高的温度下（约120-200 nm）进行进一步热处理130摄氏度）以研究其高温稳定性。实验研究包括扫描电子显微镜，原子力显微镜和常规透射电子显微镜。研究表明膜的形态不稳定性。通过能量色散X射线光谱法测定的阳离子浓度分布以及通过X射线衍射进行的研究表明，膜岛由固溶体组成。如高分辨率电子显微镜所示，薄膜与基板之间的反应还导致在低温热处理过程中引入的失配位错的分离距离增加，以缓解晶格失配应变。本文报道并讨论了膜的形态和结构变化。

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