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首页> 外文期刊>Journal of Materials Research >Influence of deposition parameters on mechanical properties of sputter-deposited Cr_2O_3 thin films
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Influence of deposition parameters on mechanical properties of sputter-deposited Cr_2O_3 thin films

机译：沉积参数对溅射沉积Cr_2O_3薄膜力学性能的影响

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Among the oxides, Cr_2O_3 exhibits the highest hardness value and a low coeffcient of friction. These properties make chromium oxide an excellent coating material for tribological applications. Cr_2O_3, thin films were deposited by radio-frequency reactive magnetron sputtering at substrate temperature in the range 363-593 K. The hardness and elastic modulus of the films were measured by two complementary nanoindentation techniques to investigate the influences of the substrate temperature and the oxygen content in the sputtering gas. While the continuous stiffness data method provides information throughout the whole film thickness, nanoindentation combined with scanning force microscopy of the residual imprints allows visualiza- tion of pileup, cracking, and delamination from the substrate. Hardness values up to 32 GPa were obtained for substrate temperatures exceeding 500 K and oxygen contents between l5 and 25 of the total gas pressure. The films, obtained with these deposition conditions, showed good adhesion to silicon substrates.
机译：在氧化物中，Cr_2O_3表现出最高的硬度值和低的摩擦系数。这些特性使氧化铬成为摩擦学应用的极佳涂料。 Cr_2O_3薄膜是通过射频反应磁控溅射在基板温度363-593 K范围内沉积的。采用两种互补的纳米压痕技术测量薄膜的硬度和弹性模量，以研究基板温度和氧气的影响。溅射气体中的含量。尽管连续刚度数据方法可提供整个膜厚度的信息，但纳米压痕与残留压痕的扫描力显微镜相结合，可观察到基材上的堆积，破裂和分层。对于超过500 K的基材温度和氧气含量在总气压的15％到25％之间，可获得高达32 GPa的硬度值。在这些沉积条件下获得的膜显示出对硅基底的良好粘附性。

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