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首页> 外文期刊>Journal of nano research >Pressure-Driven Gas Flow through Nano-Channels at High Knudsen Numbers
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Pressure-Driven Gas Flow through Nano-Channels at High Knudsen Numbers

机译：压力驱动的气流以高克努森数通过纳米通道

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摘要

Flow through nano-channels is important in several fields, ranging from natural porous media to microfluidics. It is therefore important to study the flow under controlled conditions. While quite a lot of work has been done on the flow of liquids through nano-channels, comparatively little systematic work has been done on gas flow. Here we present a study of the flow of argon through nanochannels. We study samples with 2000 parallel nano-channels, with quadratic cross section. Each side is 100 nm. The total length is 20 mu m. The nano-channels are made by patterning a Si< 110 > wafer using electron beam lithography (EBL) followed by reactive ion etching and with subsequent anodic bonding between silicon and a borosilicate glass as a top plate. The samples were investigated using a home-built apparatus which allows us to measure flow at high Knudsen numbers (from around 10 to 550). We compare our results with a range of theoretical flow models. As innovation this work provides measurements of gas transport from the home-built apparatus. The system records the pressure profile of each sample and the mass flow rate is calculated numerically from the pressure data.
机译：从天然多孔介质到微流体，通过纳米通道的流动在多个领域都很重要。因此，在受控条件下研究流量很重要。尽管在通过纳米通道的液体流动方面已经做了很多工作，但是在气体流动方面却很少进行系统的工作。在这里，我们介绍了氩气通过纳米通道流动的研究。我们研究了具有2000个平行纳米通道，横截面为二次截面的样品。每侧为100 nm。总长度为20微米。通过使用电子束光刻（EBL）对Si <110>晶片进行构图，随后进行反应性离子刻蚀以及随后在硅和作为顶板的硼硅酸盐玻璃之间进行阳极键合，来制造纳米通道。使用家用仪器对样品进行了研究，这使我们能够测量高努数（大约10至550）下的流量。我们将我们的结果与一系列理论流量模型进行比较。作为一项创新，这项工作提供了对来自家用设备的气体传输的测量。系统记录每个样品的压力曲线，并从压力数据中以数字方式计算质量流量。

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