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首页> 外文期刊>Journal of nano research >Characterizations and Process Parameters of Titanium Dioxide Thin Film by RF Sputtering
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Characterizations and Process Parameters of Titanium Dioxide Thin Film by RF Sputtering

机译：射频溅射二氧化钛薄膜的表征及工艺参数

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摘要

In this study, we successfully combined RF magnetron sputtering of a pure Ti metal target and one-stage oxidation process with a wider oxygen ratio (10%-90%) and total sputtering flow rate (16-24 sccm) to produce TiO_2 thin films on a glass substrate. The crystallization, morphology, roughness, and thickness of the thin films were examined using XRD, HR-FESEM, AFM, and a profilometer. Subsequently, the photocatalytic performance was examined using a spectrometer and video tensiometer. The experimental results show that the TiO_2 thin films with a majority of anatase and higher roughness exhibit superior photocatalytic performance; the total sputtering gas flow rate of 18 sccm and oxygen content at 10% is the optimal option. Finally, an empirical formula to correlate the film thickness with deposition time was conducted for the sputtering flow rate of 18 sccm and the oxygen content of 10%.
机译：在这项研究中，我们成功地将纯钛金属靶材的射频磁控溅射与具有更宽的氧比（10％-90％）和总溅射流量（16-24 sccm）的一阶段氧化工艺相结合，以生产TiO_2薄膜在玻璃基板上。使用XRD，HR-FESEM，AFM和轮廓分析仪检查薄膜的结晶，形态，粗糙度和厚度。随后，使用光谱仪和视频张力计检查光催化性能。实验结果表明，大多数锐钛矿型和较高粗糙度的TiO_2薄膜均具有优异的光催化性能。最佳选择是总溅射气体流速为18 sccm，氧气含量为10％。最后，针对溅射流量为18 sccm，氧含量为10％的情况，建立了使膜厚与沉积时间相关的经验公式。

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  • 来源
    《Journal of nano research》 |2013年第2013期|9-21|共13页
  • 作者

    Chii-Rong Yang; Tun-Ping Teng; Yun-Yu Yen;

  • 作者单位

    Department of Mechatronic Technology, National Taiwan Normal University, No. 162, Sec. 1, He-ping E. Rd., Da-an District, Taipei City 10610, Taiwan, ROC;

    Department of Industrial Education, National Taiwan Normal University, No. 162, Sec. 1, He-ping E. Rd., Da-an District, Taipei City 10610, Taiwan, ROC;

    Display Technology Center, Industrial Technology Research Institute, No. 195, Sec. 4, Chung Hsing Rd., Chutung, Hsinchu 31040, Taiwan, ROC;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    Oxidation; Photocatalytic performance; Thin films; Titanium dioxide;

    机译：氧化;光催化性能;薄膜;二氧化钛;

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