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Thin Films of Kanthal and Aluminum for Electromagnetic WaveAbsorption

机译：Kanthal和铝的薄膜用于电磁波吸收

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The miniaturization of electronic circuits and the scientific interest in the high frequency behavior of materials have led to extensive research on thin film conduction and loss mechanisms. With the purpose of studying the loss mechanisms and their relation to microstructure and thickness effects, Kanthal and aluminum thin films with thicknesses in the range of 5-200 nm were deposited by PVD in a polymeric unheated substrate. The experimental results showed that Kanthal films exhibit a maximum absorption of 48% for a thickness of 29 nm, while aluminum films have a maximum absorption of 25% for a thickness of 7.5 nm (for a deposition rate of 0.5 A.s"') and 23% for a thickness of 10.0 nm (for a deposition rate of 5 A.s"1). The absorption of aluminum is only due to electric losses, while the absorption of Kanthal (an iron, copper and aluminum alloy) is attributed to electric and magnetic losses.
机译：电子电路的小型化以及对材料高频特性的科学兴趣导致对薄膜传导和损耗机制的广泛研究。为了研究损失机理及其与微观结构和厚度效应的关系，通过PVD将厚度为5-200nm的Kanthal薄膜和铝薄膜沉积在未加热的聚合物基底中。实验结果表明，Kanthal膜在29 nm厚度下的最大吸收率为48％，而铝膜在7.5 nm厚度下的最大吸收率为25％（沉积速率为0.5 As“'）和23对于10.0nm的厚度，％（对于5As-1的沉积速率）。铝的吸收仅归因于电损耗，而Kanthal（铁，铜和铝合金）的吸收归因于电和磁损耗。

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