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首页> 外文期刊>Journal of porous materials >Surface and interface analysis of nanostructured porous silicon layers fabricated at low temperatures from highly doped silicon substrate: application in optical filters
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Surface and interface analysis of nanostructured porous silicon layers fabricated at low temperatures from highly doped silicon substrate: application in optical filters

机译：高掺杂硅衬底在低温下制备的纳米结构多孔硅层的表面和界面分析：在光学滤波器中的应用

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摘要

The influence of low temperature of the electrolyte on the surface and interface of porous silicon and its application in optical devices has been studied. Porous Si-bulk Si interface profile was observed by means of the high resolution SEM images. At low temperatures, a decrease in the interface roughness and an increase in the pore size has been observed. These results were used to fabricate optical filters for UV and visible regions at low temperatures. As compared to the filters fabricated at room temperature an increased optical response is reported for the filters formed at low temperature.
机译：研究了电解质的低温对多孔硅的表面和界面的影响及其在光学器件中的应用。通过高分辨率SEM图像观察到多孔的Si-本体Si界面轮廓。在低温下，已经观察到界面粗糙度的降低和孔径的增加。这些结果被用于制造用于低温下的UV和可见光区域的滤光器。与在室温下制造的滤光片相比，据报道，在低温下形成的滤光片的光学响应增加。

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