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首页> 外文期刊>Journal of power sources >Li-ion transport kinetics in LiMn_2O_4 thin films prepared by radio frequency magnetron sputtering
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Li-ion transport kinetics in LiMn_2O_4 thin films prepared by radio frequency magnetron sputtering

机译：射频磁控溅射制备LiMn_2O_4薄膜中的锂离子迁移动力学

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摘要

LiMn_2O_4 thin films were deposited on silica glass substrates by radio frequency (RF) magnetron sputtering. The films were characterized by X-ray diffraction (XRD) and scanning electron microscope (SEM). Li-ion chemical diffusion coefficients D_(Li) were measured by cyclic voltammetry (CV), potentiostatic intermittent titration technique (PITT), electrochemical impedance spectroscopy (EIS) and limiting current density (LCD). The D_(Li) values depended on the content of Li in Li_xMn_2O_4. It was found that the D_(Li) values by CV, PITT and LCD were in the order of 10~(-10), 10~(-11) and 10~(-12) cm~2 s~(-1), respectively, and those by EIS were in the range of 10~(-9) to 10~(-11) cm~2 s~(-1). The D_(Li) values obtained by above methods were compared with those by an electron blocking method. It turned out that the D_(Li) values by the electron blocking method were more comparable with those by EIS.
机译：通过射频（RF）磁控溅射将LiMn_2O_4薄膜沉积在石英玻璃基板上。通过X射线衍射（XRD）和扫描电子显微镜（SEM）对膜进行表征。通过循环伏安法（CV），恒电位间歇滴定技术（PITT），电化学阻抗谱（EIS）和极限电流密度（LCD）测量锂离子化学扩散系数D_（Li）。 D_（Li）值取决于Li_xMn_2O_4中Li的含量。通过CV，PITT和LCD发现D_（Li）值依次为10〜（-10），10〜（-11）和10〜（-12）cm〜2 s〜（-1）和EIS测得的值分别在10〜（-9）至10〜（-11）cm〜2 s〜（-1）范围内。将通过上述方法获得的D_（Li）值与通过电子阻挡法获得的D_（Li）值进行比较。结果表明，电子阻挡法的D_（Li）值与EIS的可比性更高。

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