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首页> 外文期刊>Journal of Sciences >LOW-ENERGY-ION ENHANCED DIFFUSION AT THE SURFACE OF METALS
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LOW-ENERGY-ION ENHANCED DIFFUSION AT THE SURFACE OF METALS

机译：金属表面的低能离子增强扩散

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Radiation enhanced diffusion at the surface of metals has been observed and studied for low-energy nitrogen ions at the surface of copper. The displacement of the target atoms during irradiation creates vacancies and other defects near the surface, thus enhancing the diffusion of implanted materials toward the surface and also into the solid. The mechanism has been studied here by a special method. An overcoat layer has been evaporated on the surface of the thin film sample following the implantation and the defects have been produced in the overcoat layer by another ion. The original implanted ions are observed to diffuse to the new surface through the open channels created by the auxiliary ions. The effect of this diffusion on the range distributions of low-energy ions in copper has also been discussed.
机译：已经观察到并研究了金属表面辐射增强的扩散，并研究了铜表面的低能氮离子。辐照期间目标原子的位移在表面附近产生空位和其他缺陷，从而增强了植入材料向表面以及向固体的扩散。此处已通过特殊方法研究了该机制。注入之后，在薄膜样品的表面上蒸发了外涂层，并且在外涂层中由另一种离子产生了缺陷。观察到原始注入的离子通过辅助离子产生的开放通道扩散到新表面。还讨论了这种扩散对铜中低能离子范围分布的影响。

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