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Development of Space-Qualified Photocurable-Silsesquioxane-Coated Polyimide Films

机译：开发符合太空要求的光固化倍半硅氧烷涂层聚酰亚胺薄膜

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摘要

Silsesquioxane (RSiO3/2) has been researched as a potential atomic-oxygen protective-coating material for spacecraft applications. To this end, the present study focuses on the development of photocurable silsesquioxane (SQ series, manufactured by Toagosei Co., Ltd.) coating on polyimide base films. Photocurable silsesquioxanes "SQ series" are a new type of organic-inorganic hybrid materials that feature photoinitiated polymerizable groups (organic units) introduced into silsesquioxane frameworks (inorganic units) as multifunctional groups at an intramolecular level. This coating has the following excellent properties for use as a protective coating for space materials: 1) high atomic-oxygen tolerance, 2) high adhesion to substrate material (polyimide), 3) high transparency, 4) low outgassing and low recondensability, and 5) ease of handling. In a previous research, fundamental space-application data for two types of SQ coatings have been presented. In this study, two types of space-qualified polyimide films have been selected, both of which were 25 mu m thick and aluminized on the rear. Roll-to-roll wet-coating technology has been adopted for this product with a width of 1 m. The SQ-coated films thus obtained were evaluated for their resistance to space environmental factors, such as atomic oxygen, electron beam, and ultraviolet irradiations; thermal cycling; and high-temperature-vacuum conditions. The acquired outgassing properties complied with the American Society for Testing and Materials E 595 standard. Volume-resistivity data were also acquired. The results indicate excellent space environmental tolerance in the prepared coatings. Thus, the present study established a facile roll-to-roll wet-coating process for developing SQ coating on two types of polyimide base films.
机译：倍半硅氧烷（RSiO3 / 2）已被研究为航天器应用中潜在的原子氧保护涂层材料。为此，本研究着重于在聚酰亚胺基膜上的光固化性倍半硅氧烷（SQ系列，由Toagosei Co.，Ltd。制造）的开发。可光固化的倍半硅氧烷“ SQ系列”是一种新型的有机-无机杂化材料，其特征在于，在分子倍数上以多官能团形式引入到倍半硅氧烷骨架（无机单元）中的光引发聚合基团（有机单元）。该涂层具有以下优异的性能，可用作航天材料的保护涂层：1）高原子氧耐受性，2）对基材材料（聚酰亚胺）的高附着力，3）高透明度，4）低脱气性和低再凝结性，以及5）易于处理。在先前的研究中，已经提供了两种SQ涂层的基本空间应用数据。在这项研究中，已选择了两种类型的空间合格的聚酰亚胺薄膜，两者均为25微米厚并在背面镀铝。该产品采用卷对卷湿涂技术，宽度为1 m。评价由此获得的SQ涂覆的膜对诸如原子氧，电子束和紫外线辐射的空间环境因素的抗性。热循环；和高温真空条件。所获得的除气性能符合美国测试与材料学会E 595标准。还获得了体积电阻率数据。结果表明所制备的涂料具有优异的空间环境耐受性。因此，本研究建立了一种简便的卷对卷湿涂工艺，用于在两种类型的聚酰亚胺基膜上开发SQ涂层。

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  • 来源
    《Journal of Spacecraft and Rockets》 |2016年第6期|1028-1034|共7页
  • 作者

    Kimoto Yugo; Fujita Takeshi; Furuta Naomasa; Kitamura Akinori; Suzuki Hiroshi;

  • 作者单位

    Japan Aerosp Explorat Agcy, Ibaraki 3058505, Japan|Res & Dev Directorate, Res Unit 1, 2-1-1 Sengen, Tsukuba, Ibaraki, Japan;

    Toagosei Co Ltd, Nagoya, Aichi 4550026, Japan|Gen Ctr Res & Dev, Appl Res Lab, Minato Ku, 8 Showa Cho, Hitachi, Ibaraki, Japan;

    Toagosei Co Ltd, Nagoya, Aichi 4550026, Japan|Gen Ctr Res & Dev, Appl Res Lab, Minato Ku, 8 Showa Cho, Hitachi, Ibaraki, Japan;

    Toagosei Co Ltd, Nagoya, Aichi 4550026, Japan|Gen Ctr Res & Dev, BaseTechnol Ctr, Minato Ku, 8 Showa Cho, Hitachi, Ibaraki, Japan;

    Toagosei Co Ltd, Tokyo 1058419, Japan|Adv Chem Dept, Elect & Amen Care Mat Grp, Minato Ku, 1-14-1 Nishi Shimbashi, Hitachi, Ibaraki, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
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