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Atomic-Oxygen Durability of a Silicone Paint: Comparison Between Two Simulation Methods

机译：有机硅涂料的原子氧耐久性：两种模拟方法的比较

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摘要

The present work summarizes durability tests of white antistatic silicone paint, SCK5, in a simulated low-Earth-orbit atomic-oxygen environment. Two types of the simulation systems were used: a plasma asher and a laser-detonation source producing a 5-eV atomic-oxygen beam. The SCK5-coated samples were also exposed to argon plasma, in order to separate between chemical effects of atomic oxygen and physical effects introduced by the plasma. A comparative study of the erosion yield, the surface morphology, and the chemical composition resulting from exposure to similar equivalent atomic-oxygen fluences in both types of simulation systems was performed. The SCK5 exposed to oxygen plasma showed significant cracking, whereas similar exposures to the 5-eV atomic-oxygen beam exhibited no cracking. In both cases the exposed samples showed a decrease of the carbon atomic concentration and an increase of the oxygen concentration in the upper surface layer. It is concluded that the erosion of SCK5 by the oxygen plasma is considerably more severe than by the 5-eV atomic oxygen, at least for the specific case of a porous siliconic material, tested in the present work. The observed results are most probably associated with the nature of the reactive species in the plasma asher, their omnidirectional flux, and the high porosity of SCK5 coating.
机译：本工作总结了白色抗静电有机硅涂料SCK5在模拟的低地球轨道原子氧环境下的耐久性测试。使用了两种类型的模拟系统：等离子灰化器和产生5 eV原子氧束的激光爆破源。涂有SCK5的样品也暴露于氩等离子体中，以便在原子氧的化学作用和等离子体引入的物理作用之间进行区分。在两种类型的模拟系统中，进行了腐蚀产量，表面形态和化学成分的比较研究，这些腐蚀量是由于暴露于相似的等效氧通量引起的。暴露于氧等离子体中的SCK5表现出明显的开裂，而暴露于5-eV原子氧束的相似暴露则未发现开裂。在两种情况下，暴露的样品在上表面层中均显示出碳原子浓度的降低和氧浓度中的升高。结论是，至少对于本工作中测试的多孔硅材料的特定情况，氧等离子体对SCK5的腐蚀比5-eV原子氧严重得多。观察到的结果很可能与等离子灰烬中反应性物质的性质，它们的全向通量以及SCK5涂层的高孔隙率有关。

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