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ALD-Grown Metal Oxide Films for the Detection of Molecular Contaminants on Spacecraft

机译:用于检测宇宙飞船上的分子污染物的ALD-生长的金属氧化物膜

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摘要

Mitigating molecular contamination during the assembly, integration, and testing of space systems requires quantitative and qualitative methods to detect the presence of molecular films on sensitive surfaces. Atomic layer deposition (ALD) is a self-limiting deposit of a variety of films layer by layer in the vapor phase on multiple types of substrates. The controlled layer-by-layer deposition enables the user to change orientation, morphology, and grain size in films, which directly impacts optical and electronic responses. In this study, the authors demonstrate the ability to use ALD-grown metal oxide thin films coupled with a Raman spectrometer to provide early detection of molecular films on witness surfaces during the assembly, integration, and testing of space flight hardware.
机译:在装配,集成和空间系统测试期间减轻分子污染需要定量和定性方法来检测敏感表面上的分子膜的存在。原子层沉积(ALD)是通过多种基材上的气相中的层自限制膜层的自限制沉积物。受控层逐层沉积使得用户能够在薄膜中改变方向,形态和晶粒尺寸,这直接影响光学和电子响应。在这项研究中,作者证明了使用与拉曼光谱仪联接的ALD生长的金属氧化物薄膜的能力,以在装配,集成和测试空间飞行硬件的测试过程中提前检测分子膜。

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