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首页> 外文期刊>Journal of the Mechanics and Physics of Solids >The role of the configurational force balance in the nonequilibrium epitaxy of films
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The role of the configurational force balance in the nonequilibrium epitaxy of films

机译：构型力平衡在薄膜非平衡外延中的作用

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We discuss the epitaxial growth of an elastic film, allowing for stress and diffusion within the film surface as well as nonequilibrium interactions between the film and the vapor. Our approach, which relies on recent ideas concerning configurational forces, is based on: (ⅰ) standard (Newtonian) balance laws for forces and moments together with an independent balance law for configurational forces; (ⅱ) atomic balances, one for each species of mobile atoms; (ⅲ) a mechanical version of the second law that accounts for temporal changes in free energy, energy flows due to atomic transport, and power expended by both standard and configurational forces; (ⅳ) thermodynamically consistent constitutive relations for the film surface and for the interaction between the surface and the vapor environment. The normal component of the configurational force balance at the surface represents a generalization, to a dynamical context involving dissipation, of a condition that would arise in equilibrium by considering variations of the total free energy with respect to the configuration of the film surface. Our final results consist of partial differential equations that govern the evolution of the film surface.
机译：我们讨论了弹性膜的外延生长，它允许膜表面内的应力和扩散以及膜与蒸气之间的非平衡相互作用。我们的方法基于关于构型力的最新思想，基于：（ⅰ）标准（牛顿）力和力矩平衡定律，以及独立的构型力平衡定律； （ⅱ）原子平衡，每一种活动原子中有一个； （ⅲ）第二定律的机械形式，它解释自由能的瞬时变化，由于原子传输引起的能量流以及标准力和构型力所消耗的功率； （ⅳ）膜表面以及表面与蒸气环境之间相互作用的热力学本构关系。在表面上的构型力平衡的法向分量代表了一种动态的，涉及耗散的条件，该条件是通过考虑总自由能相对于薄膜表面构型的变化而在平衡中出现的。我们的最终结果包括控制薄膜表面演变的偏微分方程。

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