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Synthesis and Characterization of Polymer Nanofoams

机译：聚合物纳米泡沫的合成与表征

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摘要

In order to obtain thin film dielectric layers with very low dielectric constants for use in microelectronic devices, polyimide nanofoamed films has been prepared from the polyimide precursors (PMDA-ODA) and poly(ethylene oxide) (PEO) in N,N-dimethylacetamide. The synthesization process included blending polyimide as the major phase with a minor phase of the thermally labile PEO blocks. The foamed films were characterized by a variety of experiments including TG and SEM, and the experimental results indicated that the labile PEO would undergo oxidative thermolysis to release small moleculars from the matrix so as to leave voids into the polyimide matrix. The dielectric properties of the films were studied over broad frequency ranges. The dependences of dielectric constant on the PEO content in the films and frequency were discussed. The films with a proper amount of PEO displayed relatively low dielectric constant compared to the pure polyimide film. Thin film foams with high thermal stability and low dielectric constants can be prepared using the approach.
机译：为了获得用于微电子器件的具有非常低的介电常数的薄膜介电层，已经在N，N-二甲基乙酰胺中由聚酰亚胺前体（PMDA-ODA）和聚环氧乙烷（PEO）制备了聚酰亚胺纳米发泡膜。合成过程包括将聚酰亚胺作为主要相与不稳定的PEO嵌段的次要相混合。通过包括TG和SEM在内的各种实验对泡沫膜进行了表征，实验结果表明，不稳定的PEO会经历氧化热解，从基体中释放出小分子，从而在聚酰亚胺基体中留下空隙。在较宽的频率范围内研究了薄膜的介电性能。讨论了介电常数对薄膜中PEO含量和频率的依赖性。与纯聚酰亚胺膜相比，具有适量PEO的膜显示出较低的介电常数。可以使用该方法制备具有高热稳定性和低介电常数的薄膜泡沫。

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