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首页> 外文期刊>Key Engineering Materials >CVD REACTORS FOR COATING TiN THIN FLMS ONTO A TUNGSTEN CARBIDE SURFACE
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CVD REACTORS FOR COATING TiN THIN FLMS ONTO A TUNGSTEN CARBIDE SURFACE

机译：CVD反应器，用于在碳化钨表面上涂覆微小的薄膜

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摘要

The process of chemical vapor deposition of TiN coating onto a cutting tool surface was studied experimentally and theoretically. The studies were concerned with thermodynamics, kinetics and operating parameters of the process. A mathematical model was set up to describe the transport phenomena in a cold-wall reactor and a hot-wall reactor. Finite element method was applied for this two dimensional problem. Flow patterns, temperature and concentration distributions, and deposition rate were obtained and their effects were studied. In addition, effects of reactor configuration on TiN thin film quality was discussed. Previous studies on TiN deposition and on other CVD proces were also reviewed and discussed.
机译：对TiN涂层化学气相沉积在切削刀具表面的过程进行了实验和理论研究。研究涉及过程的热力学，动力学和操作参数。建立了描述冷壁反应堆和热壁反应堆中运输现象的数学模型。对此二维问题应用了有限元方法。获得了流型，温度和浓度分布以及沉积速率，并研究了它们的影响。此外，讨论了反应器配置对TiN薄膜质量的影响。还回顾和讨论了有关TiN沉积和其他CVD工艺的先前研究。

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