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首页> 外文期刊>Materials Chemistry and Physics >Arc plasma deposition of TiSiN/Ni nanoscale multilayered coatings
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Arc plasma deposition of TiSiN/Ni nanoscale multilayered coatings

机译：TiSiN / Ni纳米多层涂层的电弧等离子体沉积

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摘要

Nanostructured alternate TiSiN/Ni multilayer coatings were deposited by the cathodic arc technique on Si, C45 and M2 steel substrates in nitrogen atmosphere. The films were investigated for elemental and phase composition, texture, modulation periodicity, microstructure, residual stress, hardness, adhesion and tribological behavior using X-ray photoelectron spectroscopy (XPS), glow discharge optical spec-troscopy (GDOS), high angle X-ray diffraction (XRD), X-ray reflectivity (XRR), surface profilometry, hardness and adhesion measurements, and tribological tests. The characteristics of the multilayers, with bilayer periods ranging from ～ 7 to 27 nm, were compared with those of the TiSiN single layer coating. Depending on the modulation period, the TiSiN/Ni coatings exhibited lower internal stress (0.19-0.76 GPa) and better adhesion (critical loads in the range 51-68 N) when compared to TiSiN films (1.96 GPa and 32 N, respectively). The maximum hardness (29.1 GPa), with a value 1.2 times the rule-of-mixtures value, was measured for the coating with the bilayer period of about 15 nm. A good wear and friction performance was found.
机译：在氮气气氛下，通过阴极电弧技术在Si，C45和M2钢基底上沉积了纳米结构的交替TiSiN / Ni多层涂层。使用X射线光电子能谱（XPS），辉光放电光谱（GDOS），高角度X-射线对薄膜的元素和相组成，织构，调制周期，微观结构，残余应力，硬度，附着力和摩擦学性能进行了研究。射线衍射（XRD），X射线反射率（XRR），表面轮廓仪，硬度和附着力测量以及摩擦学测试。将双层周期为〜7至27 nm的多层膜的特性与TiSiN单层涂层的特性进行了比较。取决于调制周期，与TiSiN膜（分别为1.96 GPa和32 N）相比，TiSiN / Ni涂层表现出较低的内部应力（0.19-0.76 GPa）和更好的附着力（临界载荷在51-68 N范围内）。对于双层周期为约15 nm的涂层，测量其最大硬度（29.1 GPa），其值为混合规则值的1.2倍。发现良好的磨损和摩擦性能。

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