Effect of thiourea and lead acetate on the deposition of electroless nickel

Kwang-Lung Lin; Jia-Wei Hwang

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Effect of thiourea and lead acetate on the deposition of electroless nickel

机译：硫脲和乙酸铅对化学镀镍沉积的影响

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Thiourea and lead acetate were selected for comparison of their effects on deposition rate, crystallinity, surface morphology, and phosphorus content of electroless nickel deposit. In the investigated pH range 4-5, thiourea gives rise to higher deposition rates yet lower phosphorus contents than lead acetate. The results of SEM and AFM investigation show that coarse nodule and relatively rough surface morphology are obtained in the presence of thiourea. A higher pH value as well as a greater thiourea concentration tends to enhance the crystallization of the electroless nickel deposit.

机译：选择硫脲和乙酸铅来比较它们对化学镀镍沉积物的沉积速率，结晶度，表面形态和磷含量的影响。在所研究的pH范围4-5中，与乙酸铅相比，硫脲的沉积速率更高，磷含量更低。 SEM和AFM研究的结果表明，在硫脲存在下，可获得粗大的结节和相对粗糙的表面形态。较高的pH值和较高的硫脲浓度往往会增强化学镀镍沉积物的结晶。

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来源
《Materials Chemistry and Physics》 |2002年第2期|p.204-211|共8页
作者
Kwang-Lung Lin; Jia-Wei Hwang;
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作者单位

Department of Materials Science and Engineering, National Cheng Kung University, Tainan 70101, Taiwan, ROC;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
原文格式 PDF
正文语种 eng
中图分类工程材料学;工程基础科学;
关键词
thiourea; lead acetate; electroless nickel;

机译：硫脲;乙酸铅;化学镍;

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1. Electroless Deposition of Pure Nickel Films form a Simple Solution Consisting of Nickel Acetate and Hydrazine [J] . S. Yae, K. Ito, T. Hamada Plating & Surface Finishing . 2005,第4期

机译：纯镍膜的化学沉积形成了一种由乙酸镍和肼组成的简单溶液
2. ELECTROLESS DEPOSITION OF NICKEL ON LEAD ZIRCONIUM TITANATE CERAMICS: PREPARATION, MAGNETIC AND MAGNETOELECTRIC PROPERTIES [J] . K. BI* H. HONG W. WU and Y. G. WANG Surface Review and Letters . 2012,第6期

机译：镍钛酸铅陶瓷上无电沉积镍的制备，磁和电磁性能
3. Electroless deposition of nickel on lead zirconium titanate ceramics: Preparation, magnetic and magnetoelectric properties [J] . Bi K., Hong H., Wu W., Surface review and letters . 2012,第6期

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4. Electroless Deposition of Bright/Black Pure Nickel Films from Simple SolutionConsists of Nickel Acetate and Hydrazine [C] . S. Yae, K. Ito, T. Hamada, AESF SUR/FIN 2004 amp; interfinish 2004 world congress . 2004

机译：通过简单的溶液化学沉积亮/黑纯镍膜包括乙酸镍和肼
5. Hardness characteristics of cobalt/chromium and nickel/chromium by electrodeposition or electroless deposition. [D] . Chen, Wei. 2005

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6. Electroless Nickel Deposition for Front Side Metallization of Silicon Solar Cells [O] . Shu Huei Hsieh, Jhong Min Hsieh, Wen Jauh Chen, 2017

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7. Radiotracer and Electrochemical Studies of the Underpotential Deposition of Thallium and Lead in Relation to the Inhibition of Electroless Nickel Deposition [O] . Masao MATSUOKA, Masayuki YOKOI, Tadao HAYASHI 1978

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8. A CORRELATION BETWEEN THE OVERALL STABILITY CONSTANTS OF METAL COMPLEXES V. Nickel-Ethoxyacetate, Nickel (Ethy!thio)acetate, Zinc-Ethoxyacetate, Zinc-(Ethyithio)acetate and Lead-Ethoxyacetate Systems [R] . M. H. Mihailov, V. Ts.Mihailova, V. A. Khalkin 1972

机译：金属络合物的整体稳定常数之间的相互关系V.镍 - 乙氧基乙酸酯，乙酸（乙基硫代）乙酸酯，乙氧基乙酸锌，乙酸 - （乙硫基）乙酸酯和乙氧基乙酸铅体系

Effect of thiourea and lead acetate on the deposition of electroless nickel

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