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Thermo mechanical properties and plastic deformation of gold nanolines and gold thin films

机译:金纳米线和金薄膜的热机械性能和塑性变形

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摘要

The material behavior of nano-shaped and -scaled materials is a key issue for their system integration in modern micro electro-mechanical systems (MEMS). In this article, the thermo mechanical properties of (i) homogeneous gold thin films with a thickness of 20 nm on polyimide substrate and (ii) gold nanoline ensembles with 40 nm width, 20 nm height and 1 mm length on polyimide substrate were measured using the synchrotron based sin2()-tensile testing technique. Both, passivated and unpassivated samples were tested in a temperature range of 173-393 K. As main findings: (i) homogeneous thin films are remarkably stronger than the nanolines, (ii) the yield strength shows a strong temperature dependence, and (iii) the yield strength of passivated samples is significantly increased compared to their unpassivated counterparts. The activation energy also shows a pronounced temperature dependency and indicates plastic deformation controlled by (i) dislocation motion for temperatures below 223 K, (ii) diffusion along (111) surfaces in the temperature range of 223-343 K and (iii) diffusion along the remaining surfaces (others than (111)) in the temperature range of 334-393 K.
机译:纳米级和纳米级材料的材料性能是其在现代微机电系统(MEMS)中的系统集成的关键问题。在本文中,使用以下方法测量了(i)在聚酰亚胺基板上厚度为20 nm的均质金薄膜和(ii)在聚酰亚胺基板上厚度为40 nm,宽度为20 nm,高度为1 mm的金纳米线团的热机械性能。基于同步加速器的sin2()拉伸测试技术。钝化和未钝化样品均在173-393 K的温度范围内进行了测试。作为主要发现:(i)均质薄膜比纳米线强得多;(ii)屈服强度表现出很强的温度依赖性,并且(iii )与未钝化样品相比,钝化样品的屈服强度显着提高。活化能还显示出明显的温度依赖性,并表明塑性变形由(i)低于223 K的温度的位错运动控制;(ii)在223-343 K的温度范围内沿(111)表面扩散,以及(iii)沿温度扩散其余表面(除(111)以外)在334-393 K的温度范围内。

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  • 来源
    《Materials Science and Engineering》 |2011年第20期|p.6203-6209|共7页
  • 作者单位

    ETH Zurich, Department of Materials, Laboratory for Nanometallurgy, Wolfgang-Pauli-Strasse 10, CH-8093 Zurich, Switzerland;

    ETH Zurich, Department of Materials, Laboratory for Nanometallurgy, Wolfgang-Pauli-Strasse 10, CH-8093 Zurich, Switzerland;

    Karlsruhe Institute of Technology (KIT), Institute for Applied Materials (IAM), Postfach 3640, D-76021 Karlsruhe, Germany;

    Paul-Scherrer-Institute, Laboratory for Micro- and Nanotechnology, CH-5232 Villigen, Switzerland;

    Paul-Scherrer-Institute, Laboratory for Micro- and Nanotechnology, CH-5232 Villigen, Switzerland;

    ETH Zurich, Department of Materials, Laboratory for Nanometallurgy, Wolfgang-Pauli-Strasse 10, CH-8093 Zurich, Switzerland;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    gold nanolines; gold thin films; yield strength; diffusion creep; temperature;

    机译:金纳米线;金薄膜;屈服强度;扩散蠕变;温度;

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