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High ultimate tensile stress in nano-grained superelastic NiTi thin films

机译:纳米晶粒超弹性NiTi薄膜中的高极限拉伸应力

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NiTi-films were fabricated by dc magnetron sputtering from melt-cast disc targets. The freestanding films revealed superelastic properties in tensile tests. At 37℃ superelastic properties were achieved showing a closed-loop hysteresis and a plateau of more than 5% strain. The ultimate tensile strength exceeded 1180 MPa for the sputtered films at a maximum strain of 11.5%. This remarkable improvement in mechanical properties over those reported in previous studies correlates with a textured, fine grained (50-200 nm), single phase microstructure, confirmed by transmission electron microstructure. Moreover, these grains revealed a texture which was not found in earlier studies concerning sputtered films. Finally, the prepared specimens did not reveal any evidence of disc or lens shaped Ti_3Ni_4 precipitates but a relatively homogeneous chemistry.
机译:NiTi膜是通过直流磁控溅射从熔融流延的圆盘靶制成的。这些独立的膜在拉伸试验中显示出超弹性。在37℃时获得了超弹性,表现出闭环滞后和超过5%的平稳期。溅射膜的最大抗拉强度超过1180 MPa,最大应变为11.5%。与以前的研究相比,机械性能的显着改善与透射电子显微结构证实的织构化,细晶粒(50-200 nm)单相显微结构有关。此外,这些晶粒显示出在早期有关溅射薄膜的研究中未发现的质感。最后,制备的标本没有显示出任何盘状或透镜状Ti_3Ni_4沉淀的迹象,而是化学性质相对均匀的证据。

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