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High deposition rate processes for the fabrication of microcrystalline silicon thin films

机译：用于制造微晶硅薄膜的高沉积速率工艺

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摘要

The increase of deposition rate of microcrystalline silicon absorber layers is an essential point for cost reduction in the mass production of thin-film silicon solar cells. In this work we explored a broad range of plasma enhanced chemical vapor deposition (PECVD) parameters in order to increase the deposition rate of intrinsic microcrystalline silicon layers keeping the industrial relevant material quality standards. We combined plasma excitation frequencies in the VHF band with the high pressure high power depletion regime using new deposition facilities and achieved deposition rates as high as 2.8 nm/s. The material quality evaluated from photosensitivity and electron spin resonance measurements is similar to standard microcrystalline silicon deposited at low growth rates. The influence of the deposition power and the deposition pressure on the electrical and structural film properties was investigated.
机译：微晶硅吸收层的沉积速率的增加是薄膜硅太阳能电池的批量生产中降低成本的关键点。在这项工作中，我们探索了一系列等离子增强化学气相沉积（PECVD）参数，以提高本征微晶硅层的沉积速率，从而保持工业相关的材料质量标准。我们使用新的沉积设备将VHF波段中的等离子体激发频率与高压大功率耗竭机制相结合，沉积速率高达2.8 nm / s。通过光敏性和电子自旋共振测量评估的材料质量类似于以低生长速率沉积的标准微晶硅。研究了沉积功率和沉积压力对电学和结构膜性能的影响。

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  • 来源
    《Materials Science and Engineering》 |2013年第9期|691-694|共4页
  • 作者

    S. Michard; M. Meier; B. Grootoonk; O. Astakhov; A. Gordijn; F. Finger;

  • 作者单位

    Institute of Energy and Climate Research 5 - Photovoltaik, Forschungszentrum Juelich, 52425 Juelich, Germany;

    Institute of Energy and Climate Research 5 - Photovoltaik, Forschungszentrum Juelich, 52425 Juelich, Germany;

    Institute of Energy and Climate Research 5 - Photovoltaik, Forschungszentrum Juelich, 52425 Juelich, Germany;

    Institute of Energy and Climate Research 5 - Photovoltaik, Forschungszentrum Juelich, 52425 Juelich, Germany;

    Institute of Energy and Climate Research 5 - Photovoltaik, Forschungszentrum Juelich, 52425 Juelich, Germany;

    Institute of Energy and Climate Research 5 - Photovoltaik, Forschungszentrum Juelich, 52425 Juelich, Germany;

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  • 正文语种 eng
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  • 关键词

    Microcrystalline silicon; Deposition rates; PECVD; VHF excitation frequencies; HPD regime;

    机译：微晶硅;沉积率;PECVD;VHF激发频率;HPD制度;

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